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Preparation method of vanadium dioxide thin film of extremely narrow hysteretic curve width and high temperature coefficient of resistance

A temperature coefficient, thin film preparation technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of reducing material TCR, limiting application, temperature hysteresis, etc., achieving good repeatability and simple preparation method easy effect

Inactive Publication Date: 2012-10-03
DONGHUA UNIV
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Problems solved by technology

VO 2 From a thermodynamic point of view, it belongs to the first-order phase transition, and there is a temperature hysteresis phenomenon during the phase transition, which seriously limits its further application.
Affect VO 2 There are many factors affecting the hysteresis bandwidth of the film phase transition, among which doping and film particles have a greater impact. Although the current doping and film particle size reduction can reduce the width of the hysteresis curve to a certain extent, these methods at the same time Also reduces the TCR of the material

Method used

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  • Preparation method of vanadium dioxide thin film of extremely narrow hysteretic curve width and high temperature coefficient of resistance
  • Preparation method of vanadium dioxide thin film of extremely narrow hysteretic curve width and high temperature coefficient of resistance
  • Preparation method of vanadium dioxide thin film of extremely narrow hysteretic curve width and high temperature coefficient of resistance

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Embodiment Construction

[0021] In order to make the present invention more comprehensible, a preferred embodiment is described in detail below with accompanying drawings.

[0022] First, using the metal vanadium target of the JPGF400B-G magnetron sputtering apparatus to Al 2 o 3 The substrate is subjected to DC sputtering to prepare metal vanadium thin films. Al adopted 2 o 3 The substrate is 0001 oriented and the thickness is 0.5mm; the purity of the metal vanadium target used is 99.7%, the diameter of the target is 60mm, the distance between the target and the substrate is 180mm, and the rotation speed of the substrate is 13.6r / min to maintain the uniformity of the film sex. Pre-sputter for 15 minutes to clean the target surface before coating. The preparation parameters of metal vanadium thin films are shown in Table 1.

[0023] Table 1 Preparation parameters of metal vanadium thin film

[0024]

[0025] Place the prepared metal vanadium film in the RTP-500 rapid heat treatment equipment...

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Abstract

The invention provides a preparation method of a vanadium dioxide (VO2) thin film of extremely narrow hysteretic curve width and high temperature coefficient of resistance (TCR). The preparation method is characterized by comprising the following two steps of: 1, performing direct current sputtering on an Al2O3 substrate by using a metal vanadium target of a magnetron sputtering coating instrument to prepare a metal vanadium thin film; and 2, placing the metal vanadium film in a quick annealing furnace to perform oxidation treatment, then taking the oxidized metal vanadium thin film out and placing in air to naturally cool to obtain a polycrystalline VO2 thin film. The preparation method of the VO2 thin film of extremely narrow hysteretic curve width and high temperature coefficient of resistance provided by the invention is simple and practical and has high repeatability; and the analysis of a scanning electron microscope and a four-probe tester shows that the prepared VO2 thin film has a nano flaky structure, the hysteretic curve width is only about 0.4 DEG C, almost overlapping is realized and the thin film has extremely high TCR.

Description

technical field [0001] The invention relates to a vanadium dioxide (VO) with extremely narrow hysteresis curve width and high temperature coefficient of resistance 2 ) film preparation method, belongs to VO 2 Thin film preparation technology field. Background technique [0002] Infrared focal plane is the core component of infrared detectors. Infrared detector products can realize visual enhancement in conditions of extremely low visibility such as night, thick smoke, clouds, and dense fog. Infrared detectors are divided into cooled infrared detectors and uncooled infrared detectors according to whether their sensitive surfaces need cooling. The advantages of cooled infrared detectors are high sensitivity, the ability to distinguish more subtle temperature differences, and a longer detection distance. They are mainly used in high-end military applications. Compared with the cooling type, the uncooled infrared detector saves the cooling device. The detector is small in siz...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/18C23C14/58
Inventor 徐晓峰何鑫峰汪海旸陈效双褚君浩
Owner DONGHUA UNIV
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