Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for forming a decorative coating, a decorative coating, and uses of the same

A decorative, coating technology used in decorative coatings and forming decorative coatings, the method and field of application of decorative coatings, capable of addressing unfavorable, complex shapes of non-planar surfaces and poor ability of substrates and other problems, to achieve good thickness uniformity, prevent uneven color appearance, and promote the effect of optical design

Active Publication Date: 2012-09-05
青岛四方思锐智能技术有限公司
View PDF10 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem with these coating methods is their poor ability to uniformly and homogeneously coat non-planar surfaces and substrates with complex shapes
This is especially detrimental in decorative coating applications where the coating is generally intended to be uniform over the entire surface of the substrate to provide a specific appearance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for forming a decorative coating, a decorative coating, and uses of the same
  • Method for forming a decorative coating, a decorative coating, and uses of the same
  • Method for forming a decorative coating, a decorative coating, and uses of the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0077] Using different processing temperatures, an absorbing film is formed on a substrate according to a first embodiment of the invention (see figure 1 ). First, a visually substantially transparent D263T glass substrate (available from Schott AG, Germany) with a thickness of 0.3 mm was inserted into the reaction space of a P400ALD batch processing unit (available from Beneq OY, Finland). The substrate is planar, enabling reliable light transmission measurements. The substrate is placed in the reaction space such that both sides of the substrate glass are exposed (ie not shaded) to the surrounding reaction space. In this embodiment, the above-mentioned carrier gas responsible for purifying the reaction space is nitrogen (N 2 ).

[0078] After the preparation of loading the substrate into the ALD device, the reaction space of the ALD device was evacuated to negative pressure, and the carrier gas was set to flow continuously to reach a processing pressure of about 1 mbar (1...

Embodiment 2

[0086] According to the second embodiment of the present invention, an absorbing film is formed on a substrate (see figure 2 ). First, a visually substantially transparent D263T glass substrate (available from Schott AG, Germany) with a thickness of 0.3 mm was inserted into the reaction space of a P400ALD batch processing unit (available from Beneq OY, Finland). The substrate is planar, enabling reliable light transmission measurements. The substrate is placed in the reaction space such that both sides of the substrate glass are exposed (ie not shaded) to the surrounding reaction space. In this embodiment, the above-mentioned carrier gas responsible for purifying the reaction space is nitrogen (N 2 ).

[0087] After the preparation of loading the substrate into the ALD device, the reaction space of the ALD device was evacuated to negative pressure, and the carrier gas was set to flow continuously to reach a processing pressure of about 1 mbar (1 hPa), followed by heating t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

A decorative coating and a method for forming a decorative coating on a substrate (2). The decorative coating comprises an absorbing film (1) to attenuate the transmission of visible light through the coating. The method comprises the steps of bringing the substrate (2) into a reaction space, and depositing the absorbing film (1) on the substrate (2). Depositing the absorbing film (1) on the substrate comprises the steps of forming a preliminary deposit of transition metal oxide on the deposition surface and subsequently purging the reaction space, and treating the deposition surface with an organometallic chemical comprising first metal and subsequently purging the reaction space. The steps of forming the preliminary deposit and treating the deposition surface are alternately repeated to increase absorption of the absorbing film (1).

Description

field of invention [0001] This invention relates to decorative coatings. In particular, the present invention relates to decorative coatings and methods of forming decorative coatings comprising absorbing films obtained by forming a deposit on a substrate and treating the deposit with a chemical agent deposited by matter. The invention also relates to the method and the use of decorative coatings. Background of the invention [0002] Decorative coatings are often applied to objects to alter their appearance. The surface of an object can be altered, for example, or metalized, thereby changing the color of the object. Dielectric thin film structures may also be deposited on the surface of an object, giving the object a specific appearance due to light interference in the thin film structure through the reflectance spectrum of the structure. [0003] Optical interference structures or thin-film filters (filter, filter, filter) or dichroic filters, as they are often called, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/08C23C16/18C23C16/40C23C30/00C23C16/455C23C16/44C23C28/00
CPCC23C16/08C23C16/18C23C16/40C23C16/403C23C16/405C23C16/4408C23C16/45523C23C28/00C23C30/00
Inventor J·毛拉T·阿拉萨瑞拉
Owner 青岛四方思锐智能技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com