Light beam transmission stabilizing device

Abstract

The invention provides a light beam transmission stabilizing device for transmitting an emitted light beam from a laser to an illumination system, and a light beam control module is arranged on the transmission optical path, wherein the light beam control module comprises a first light beam control unit (41), a second light beam control unit (42), and a third light beam control unit (43). A spectroscope (44) is arranged on an emergent light path of the light beam control module, the spectroscope (44) divides the light beam into two beams, wherein one light beam enters an illumination system (5), and the other beam enters a light beam measuring module (45). The light beam measuring module (45) is connected with a controller (46) for supplying measured data to the controller (46). The controller (46) are connected with the first light beam control unit (41), the second light beam control unit (42) and the third light beam control unit (43) of the light beam control module for supplying control signal to the light beam control module to regulate the light beam position deviation and directional deviation.

Description

technical field [0001] The invention relates to the field of beam transmission, in particular to a beam transmission stabilizing device. Background technique [0002] Optical projection lithography uses the principle of optical projection imaging to transfer the integrated circuit (IC) pattern on the mask to the rubber-coated silicon wafer by step-and-repeat or step-and-scan exposure. [0003] figure 1 Shown is an optical projection lithography system, which mainly includes a beam expansion and shaping system 3 , a beam transmission system 4 , a lithography illumination system 5 , a mask 6 , a lithography objective lens 7 , and a silicon wafer 8 . The light beam 2 is emitted by the light source 1 that provides radiant light energy, and then passes through the beam expansion and shaping system 3 in turn, the beam 2 that is expanded and shaped, and the beam transmission system 4 enters the lithography lighting system 5, and the lithography lighting system 5 provides the mask ...

AI Technical Summary

Problems solved by technology

Therefore, a single two-dimensional controllable mirror cannot meet the performance requirements of high adjustment frequency and large adjustment range required by the beam control unit at the same time, that is, it cannot meet the adjustment of position deviation and pointing deviation at the same time; and the patent structure adopted by the first A beam control unit 141 and a second beam control unit 142 form a beam control module, and the adjustment of the beam position deviation and pointing deviation affects each other, that is, the first beam control unit 141 will adjust the beam pointing deviation while adjusting the beam position deviation The second beam control unit 142 will affect the position deviation of the beam while adjusting the pointing deviation of the beam, which makes the control algorithm of the beam transmission device more complicated

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