Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photoelectric warfare infield semi-physical simulation system based on mechanical arm

A semi-physical simulation and photoelectric countermeasure technology, applied in the field of infield simulation research, can solve the problems of high price, narrow application range, and inability to meet the needs of full real-time dynamic simulation

Inactive Publication Date: 2012-07-11
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF3 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, a complete imitation of the American AFEWES system cannot fully meet the needs of my country's current military development
On the one hand, the system still cannot meet the needs of full real-time dynamic simulation. On the other hand, the AFEWES system uses a huge optical imaging system, which is expensive. At the same time, the system mainly simulates airborne infrared countermeasures under various infrared background conditions. relatively narrow

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photoelectric warfare infield semi-physical simulation system based on mechanical arm
  • Photoelectric warfare infield semi-physical simulation system based on mechanical arm
  • Photoelectric warfare infield semi-physical simulation system based on mechanical arm

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] A mechanical arm-based electro-optical countermeasure interior field hardware-in-the-loop simulation system, the system includes: a beam 7, a mechanical arm 8, a linear motor 9, a launch pad 11, and a laser source 12, and the system also includes: a missile seeker 10, a jamming Laser transmitter 13 and target simulation source 14; the missile seeker 10 is mounted on the mechanical arm 8, and the linear motor 9 drives the mechanical arm 8 to move on the beam 7, and the interference laser transmitter 13 and target simulation source 14 Fixed on the launch pad 11.

[0014] The missile seeker 10 includes a missile photoelectric seeker hanger 15 and a high-precision two-dimensional console 16, and the missile photoelectric seeker hanger 15 and the high-precision two-dimensional console 16 are fixedly connected.

[0015] Described interference laser emitter 13 comprises base 20, actuator 21 and plane mirror 22; Actuator 21 is fixed on the base 20, and plane mirror 22 is placed...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a photoelectric warfare infield semi-physical simulation system based on a mechanical arm and belongs to the field of infield simulation and research. The system is used for realizing the full real-time dynamic semi-physical simulation, is reasonable in cost and is used for estimating the research and development on a foundation and onboard photoelectric warfare weapon system in wave bands such as visible light and medium / long wave infrared. The system comprises a guided missile guider, an interference laser emitter, a target simulation source and a launching pad, wherein the guided missile guider is hung on the mechanical arm; a linear motor is used for driving the mechanical arm to move on a cross beam; and the interference laser emitter and the target simulation source are fixed on the launching pad. A simulation interference system equivalent a laser divergence angle is used for performing real-time estimation on the tracking, the fighting time selection and the fighting performance of a laser warfare weapon after an infrared terminal guided missile attacks from a place 10km away. Meanwhile, the system provided by the invention is applied to other interference devices such as heat source and point source jammers for estimating an terminal guided section of an attacking missile.

Description

technical field [0001] The invention belongs to the field of infield simulation research, and in particular relates to a mechanical arm-based optoelectronic countermeasure infield semi-physical simulation system. Background technique [0002] In response to the increasingly tight battlefield reconnaissance technology, various high-power or pulsed laser photoelectric countermeasure weapons have emerged. Optoelectronic countermeasure weapons use laser as a source of interference or destruction, and through atmospheric transmission, the laser energy is transmitted to the photoelectric loads of various reconnaissance platforms such as enemy missiles, satellites, and drones, causing detector interference and damage. , Destroy the normal work of the enemy's photoelectric sensor and achieve effective confrontation. Combat effectiveness evaluation is one of the core issues in the research and development of electro-optical countermeasure weapons. [0003] Electronic countermeasure...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): F42B35/00F42B15/01
Inventor 邵俊峰郭劲王挺峰张合勇孙涛王锐
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products