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Photosensitive resin composition and light blocking layer using the same

A technology of photosensitive resin and composition, which is applied in the direction of photosensitive materials, optics, and optical components used in optomechanical equipment, and can solve the problems of sensitivity, development characteristics and close contact characteristics, sensitivity, developability and tightness. Achieves the effect of excellent sensitivity by eliminating problems such as reduction of contact characteristics

Active Publication Date: 2012-07-04
CHEIL IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In addition, propylene-based resins have good heat resistance, shrinkage resistance, chemical resistance, etc., but lower sensitivity, developability, and close contact characteristics
Due to the large amount of black pigment included in order to adjust the optical density of the light-blocking layer, the sensitivity, development characteristics and close contact characteristics will be significantly deteriorated

Method used

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  • Photosensitive resin composition and light blocking layer using the same
  • Photosensitive resin composition and light blocking layer using the same
  • Photosensitive resin composition and light blocking layer using the same

Examples

Experimental program
Comparison scheme
Effect test

preparation Embodiment 1-1

[0351] Preparation Example 1-1: Preparation of cardo monomers

[0352] (1) A compound represented by the following Chemical Formula 12-1 was prepared by the following steps: 29.8 g of pentaerythritol triacrylate (manufactured by Aldrich Company) and 35.43 g of propylene glycol methyl ether acetate (manufactured by Daicel Chemical Company) were put into a reactor In, this mixture is heated to 50 ℃, adds 6.8g sodium ethylate (produced by Aldrich Company) to this mixture, puts 9.3g epichlorohydrin (produced by Aldrich Company) within 30 minutes, this mixture is heated to 80 C, let it stand for 3 hours, and filtered the mixture.

[0353] [Chemical formula 12-1]

[0354]

[0355] (2) A compound represented by the following Chemical Formula 12-2 was prepared by the following steps: 35 g of 9,9'-bis(4-hydroxyphenyl)fluorene (manufactured by Hear chem Co.), 141.6 g of the compound represented by the above Chemical Formula 12-1 Compound, 0.23g benzyltriethylammonium chloride (pr...

preparation Embodiment 1-2

[0358] Preparation Example 1-2: Preparation of cardo monomers

[0359] The compound represented by the following chemical formula 13-2 was prepared by the following steps: 138 g of 9,9'-bis(4-hydroxyphenyl) fluorene (manufactured by Hear chem Co.), 355 g of the compound represented by chemical formula 13-1, 493 g of propylene glycol Methyl ether acetate (produced by Daicel Chemical Co.), 1 g of triphenylphosphine (produced by Aldrich Co.), 1.4 g of benzyltriethylammonium chloride (produced by Daejung Chemicals Co.), and 0.5 g of hydroquinone were put into In the reactor, the mixture was heated to 120°C and allowed to stand for up to 12 hours.

[0360] [Chemical formula 13-1]

[0361]

[0362] [Chemical formula 13-2]

[0363]

preparation Embodiment 1-3

[0364] Preparation Examples 1-3: Preparation of cardo monomers

[0365] (1) A compound represented by the following chemical formula 14-1 was prepared by the following steps: 138 g of 9,9'-bis(4-hydroxyphenyl)fluorene (manufactured by Hear chem Co.), 110 g of potassium hydroxide, and 700 g of water were put into into the reactor, the mixture was heated to 100° C. and left to stand for up to 12 hours, the mixture was filtered to obtain a solid, which was rinsed 5 times with up to 5 times as much water in 30 minutes at room temperature, And dry the rinsed solids.

[0366] [Chemical formula 14-1]

[0367]

[0368] (2) A compound represented by the following Chemical Formula 14-2 was prepared by the following steps: 100 g of the compound represented by the above Chemical Formula 14-1, 70 g of pyridine (produced by Daejung Chemicals Co., Ltd.), and 465 g of propylene glycol methyl ether acetate (produced by Daicel Chemical Company) was put into the reactor, the mixture was c...

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Abstract

Disclosed is a photosensitive resin composition that includes (A) a cardo-based monomer represented by the following Chemical Formula 1 or 2, (B) a cardo-based resin, (C) a reactive unsaturated compound, (D) a pigment, (E) an initiator, and (F) a solvent, and a light blocking layer using the same. In Chemical Formulae 1 and 2, each substituent is the same in the detailed description.

Description

technical field [0001] The present invention relates to a photosensitive resin composition including a cardo type monomer and a light blocking layer using the photosensitive resin composition. Background technique [0002] The liquid crystal display device includes a lower substrate, an active circuit part and an upper substrate, wherein the lower substrate includes a light blocking layer, a color filter and an ITO pixel electrode, the active circuit part includes a liquid crystal layer, a thin film transistor and a capacitor layer, and the upper substrate includes an ITO pixel electrodes. [0003] The light blocking layer blocks uncontrolled light that is transmitted out of the transparent pixel electrode of the substrate, and thus prevents a decrease in contrast due to light passing through the thin film transistor. The red, green, and blue light blocking layers transmit light having a predetermined wavelength of white light and display colors. [0004] Light-blocking la...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004G03F7/075G02B5/00G02F1/1335
CPCG03F7/075G03F7/027G02F1/1335G03F7/004G02B5/201G03F7/0007G03F7/032G02B5/00
Inventor 李昌珉金俊奭李吉成金旻成
Owner CHEIL IND INC
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