Fe3O4 (ferroferric oxide)/p-Si (p-type silicon) structure capable of regulating and controlling magneto-resistance effect with current and preparation method for same
A magnetoresistance, p-si technology, applied in the manufacture/processing of electromagnetic devices, resistors controlled by magnetic fields, material selection, etc.
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[0028] According to the structure and property analysis that we carry out to the sample prepared in the present invention, the Fe with current control magnetoresistance effect will be 3 o 4 The best implementation of the / p-Si structure is described in detail: the electrode is to let the current flow in the Fe 3 o 4 flow in the plane, that is, in the Fe3 o 4 There are four electrodes on the layer:
[0029] 1. The three-target adjustable ultra-high vacuum magnetron sputtering coating machine produced by the Shenyang Scientific Instrument Development Center of the Chinese Academy of Sciences is used. An Fe target with a purity of 99.99% is installed on the strong magnetic target head. The thickness of the target is 2mm and the diameter is 60mm; the distance between the target and the substrate holder is 10cm;
[0030] 2. After the p-type Si single crystal substrate material is cleaned of surface impurities by means of ultrasonic waves, the p-type Si single crystal substrate ...
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