Preparation method for top-gate self-aligned zinc oxide thin film transistor
A zinc oxide thin film and self-alignment technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of uneven brightness of OLED display, improve its own performance, save manufacturing costs, and reduce parasitic The effect of capacitance
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[0027] Below in conjunction with the accompanying drawings of the description, the present invention will be further described by examples.
[0028] The self-aligned zinc oxide thin film transistor of the present invention is formed on the substrate 1 of glass, as figure 1 and figure 2 shown. The thin film transistor includes a semiconductor channel region 2 , a gate dielectric layer 3 , a gate electrode 4 , a source region and a drain region 5 with low resistance, and a source electrode and a drain electrode 6 . The semiconductor channel region 2 is located on the substrate 1, the gate dielectric layer 3 is located on the semiconductor channel region 2, the gate electrode 4 is located on the gate dielectric layer 3, the source electrode and the drain electrode 6 Located at both ends of the semiconductor channel region, the source and drain electrodes are naturally isolated from the gate electrode.
[0029] A specific example of the preparation method of the thin film tran...
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