Process for producing Czochralski silicon single crystal
A production process, Czochralski silicon technology, applied in single crystal growth, single crystal growth, crystal growth, etc., can solve the problems of poor slag extraction effect, difficult to grasp the time of slag removal, low purity of silicon single crystal, etc., to achieve easy control , Reduce the probability of silicon leakage accidents, and the effect of simple processing steps
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[0043] like figure 1 A production process for a Czochralski silicon single crystal shown, comprising the following steps:
[0044] Step 1. Preparation of silicon raw material and dopant: According to the conventional preparation method of silicon raw material for single crystal furnace, the silicon raw material for growing Czochralski single crystal silicon is prepared, and according to the conventional cleaning treatment method of silicon raw material for single crystal furnace, Clean the prepared silicon raw material; at the same time, according to the type and resistivity of the silicon single crystal to be produced, determine the type and doping amount of the dopant to be added, and determine the dopant used for growing Czochralski single crystal silicon Get ready.
[0045] In this embodiment, the same as the conventional method of preparing silicon raw materials for growing Czochralski silicon single crystals, first determine the silicon single crystal production accordi...
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