Device and process for growing TiAlN film on surface of aluminum alloy in situ

Abstract

The invention relates to a device and a process for growing a TiAlN film on the surface of an aluminum alloy in situ. In the device, an ion injection source 1, a magnetron sputtering target 2, a vacuum system 3, a gas supply system 4, an ion injection control power supply 5, a magnetron sputtering control power supply 6, a rotating workpiece bracket 7 and a plurality of auxiliary observation windows and temperature measuring instruments are arranged on a vacuum chamber of which the vacuum degree is 1*10<-3> to 5*10<-4>Pa and in which a gas medium can be filled, wherein the aluminum alloy is taken as a substrate, titanium is taken as the sputtering target, nitrogen is taken as injected gas, an ion sputtering technology and an ion injection technology are compounded, argon is introduced into an ion sputtering cavity, pure titanium is sputtered by argon ions and deposited on the aluminum alloy, and N ions are injected simultaneously; by utilizing the characteristics of uniform ion sputtering, fine particles, high ion injection binding force and no deformation, the titanium is subjected to ion sputtering on the surface of the aluminum alloy, the N ions are injected simultaneously and are injected ions and a reaction element, and ion sputtering and ion injection are performed according to certain process parameters; a high-hardness TiAlN film is grown on the surface of the aluminum alloy in situ, and the aim of modifying the surface of the aluminum alloy is fulfilled; and the invention has the characteristic of good surface condition, and is precise and controllable.

Description

technical field [0001] The invention relates to an in-situ growth TiAlN film device and process on the surface of an aluminum alloy and belongs to the technical field of plasma surface modification of metal materials and ion bombardment chemical heat treatment. Background technique [0002] There are many existing metal material surface modification methods, such as magnetron sputtering, ion sputtering, etc., but each technology has its shortcomings, such as magnetron sputtering has poor bonding force, slow ion injection speed, and direct radiation. sex etc. [0003] Aluminum and aluminum alloys have low density, high strength, excellent electrical and thermal conductivity, good plasticity and formability, no low-temperature brittleness, and easy processing. At present, aluminum and aluminum alloy materials have been widely used in construction, aviation, military, automobile, navigation, medical treatment and other fields. However, the wear resistance of aluminum is poor,...

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Problems solved by technology

Thereby realizing the surface modification of aluminum alloy

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