Process liquid feed mechanism

Abstract

The invention provides a process liquid feed mechanism capable of preventing residual of the process liquid on a vessel body. The process liquid feed mechanism includes a fixed cylinder projecting upwards from a cover part to the vessel body with a thread around a peripheral surface, a movable cylinder provided coaxially with the fixed cylinder and disposed on the inner side or the outer side of the fixed cylinder, a process liquid feed tube and an operating rotator. The process liquid feed tube is fixed in an axial position relative to the movable cylinder and passes through the lid and a cylinder including the fixed cylinder and the movable cylinder to be axially movable relative to the cylinder. The operating rotator includes an annular portion provided coaxially with the movable cylinder. An engaging portion and an engaged portion, which are provided in the movable cylinder and the annular portion respectively, rotate the movable cylinder through engagement therebetween with rotation of the operating rotator and release the engagement as a torque on the movable cylinder increases. Therefore, the lower end of the process liquid feed tube is abutted against the bottom of vessel body to be fixed.

Description

technical field [0001] The present invention relates to a processing liquid supply mechanism used in a container body that stores a processing liquid such as a resist and pressurizes the processing liquid with a pressurizing gas. Background technique [0002] In the photolithography process of the manufacturing process of a semiconductor device, various processing liquids, such as a resist, are supplied to a board|substrate, for example, a semiconductor wafer (henceforth a wafer). [0003] like Figure 15 As shown, a resist supply mechanism 102 that can be attached to and detached from the liquid storage bottle 101 is provided on the liquid storage bottle 101 in which the resist 110 is stored. The resist supply mechanism 102 has a cap 104 that closes the opening 103 of the liquid storage bottle 101, and a pressurized gas such as nitrogen (N 2 ) into the liquid storage bottle 101. Accordingly, the resist 110 flows into the processing liquid supply pipe 106 whose lower end i...

AI Technical Summary

Problems solved by technology

The amount of lift-up will also vary depending on the experience and skills of the operator, and sometimes the treatment liquid will remain.

[0010] Moreover, the shape of the liquid storage bottle 101 is various, and sometimes the position adjustment of the processing liquid supply pipe 106 must be performed as described above every time the liquid storage bottle 101 is replaced, which takes time and manpower.

In Patent Document 1, an example of the above-mentioned processing liquid supply mechanism is described, but there is no description about the above-mentioned problem, and the problem cannot be solved.

In addition, in Patent Document 2, the structure of the operation panel cover is described. This operation panel cover is used for gasoline tanks, and has little relevance to the present invention, and cannot solve the above-mentioned problems.

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