Agaricus bisporus film-free preservative and use thereof
A technology of Agaricus bisporus and antistaling agent, which is applied in the field of storage and preservation of agricultural products, which can solve the problems of reduced commerciality, inconvenient operation, chemical pollution, etc., and achieves the effect of low cost and convenient operation
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Embodiment 1
[0012] A filmless antistaling agent for Agaricus bisporus, which is an aqueous solution comprising the following components in mass percent concentration: 1.2% low-molecular-weight chitosan oligosaccharide with a molecular weight of 1000-3000, 0.4% citric acid, 0.4% sodium chloride, 0.2% Vitamin C, Cysteine 0.0001%. Dissolve citric acid and sodium chloride in water first, then dissolve low molecular weight chitosan oligosaccharide, and finally dissolve vitamin C and cysteine, mix and store, and obtain membrane-free preservative I.
Embodiment 2
[0014] A filmless antistaling agent for Agaricus bisporus, which is an aqueous solution comprising the following components in mass percent concentration: 2.5% low molecular weight chitosan oligosaccharide with a molecular weight of 1000-3000, 0.6% citric acid, 0.6% sodium chloride, 0.3% Vitamin C, Cysteine 0.0003%. Dissolve citric acid and sodium chloride in water first, then dissolve low molecular weight chitosan oligosaccharide, and finally dissolve vitamin C and cysteine, mix and store, and obtain membrane-free preservative II.
Embodiment 3
[0016] A filmless preservative for Agaricus bisporus, which is an aqueous solution comprising the following components in mass percent concentration: 1.5% low molecular weight chitosan oligosaccharide with a molecular weight of 1000-3000, 0.5% citric acid, 0.5% sodium chloride, 0.2% Vitamin C, Cysteine 0.0002%. Dissolve citric acid and sodium chloride in water first; then dissolve low molecular weight chitosan oligosaccharides, add 2.5ml glacial acetic acid to help it dissolve; finally dissolve vitamin C and cysteine, mix and store, and get membrane-free preservative III.
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