Device for preparing microstep reflector structure by using a plurality of cuboid substrates

Abstract

The invention relates to a device for preparing a microstep reflector structure by using a plurality of cuboid substrates. A standard block of the device is fixed at a position, close to the left, of a first substrate, and a fine tuning bracket is fixed on the right side of the first substrate; a sliding adjustment sheet 0 is arranged at a position, close to the right side, of the first substrate 1; one end of a second substrate with metal scales is placed at the contact included corner between the standard block and the first substrate, while the other end is suspended above the sliding adjustment sheet; and the sliding adjustment sheet can move on the first substrate under the action of the fine tuning bracket to adjust the included angle between the right side of the standard block and the upper surface of the second substrate. The device effectively improves the precision of control over the height of each step, the surface roughness precision of the microstep reflector, the longitudinal dimensional precision and the repeatability.

Description

technical field [0001] The invention relates to a device for making a step structure of a micro-step reflector, in particular to a device for making a step structure of a micro-step reflector by using a plurality of cuboid substrates. Background technique [0002] The micromirror with multiple steps is a kind of light reflection device, which has more and more applications in optical systems, such as spectral analysis, beam shaping and fiber coupling. [0003] With the development of optical systems in the direction of small size and compact structure, the miniaturization of devices in optical systems has become an important research topic of optical devices. The design and production level of micro optical devices directly determines the performance of optical instruments. At present, multi-level stepped microstructures can be prepared on quartz and other material substrates through multiple photolithography and multiple etching (dry or wet) by binary optical technology. Ho...

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Problems solved by technology

At present, multi-level stepped microstructures can be prepared on quartz and other material substrates through multiple photolithography and multiple etching (dry or wet) by binary optical technology. However, this method has the following disadvantages: 1. 1. Due to multiple overlays, the horizontal accuracy is difficult to guarantee; 2. It is difficult to accurately control the corrosion or etching depth, and the accuracy and repeatability are poor, so the step height control accuracy is low and the repeatability is poor; 3. The corroded or etched reflector Surface roughness is difficult to meet the requirements of optical instruments

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