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Normally off gallium nitride field effect transistors (fet)

A gallium nitride and gallium nitride layer technology, applied in the field of normally off gallium nitride field effect transistors, can solve device reliability problems, reduce transconductance, low inversion mobility and other problems

Active Publication Date: 2011-05-25
ALPHA & OMEGA SEMICON INT LP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, such devices suffer from low inversion mobility and high electric fields in the oxide when the device is biased to break down, causing device reliability issues
To solve this problem, we increase the thickness of the oxide layer, but this reduces the transconductance and leads to an unnecessarily high RdsA

Method used

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  • Normally off gallium nitride field effect transistors (fet)
  • Normally off gallium nitride field effect transistors (fet)
  • Normally off gallium nitride field effect transistors (fet)

Examples

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Embodiment Construction

[0019] The following combination Figure 2 to Figure 7 , to describe preferred embodiments of the present invention in detail.

[0020] Please refer to figure 2 , a cross-sectional view of a heterojunction field effect transistor (HFET) semiconductor power device 100 according to the present invention. The HFET semiconductor power device 100 includes an AlGaN layer 120 epitaxially grown on a Gallium Nitride (GaN) layer 110, thereby forming an AlGaN / GaN heterojunction with a two-dimensional electron gas (2DEG) 115 at the interface . The source electrode 130 and the drain electrode 140 are disposed on two opposite sides of the gate electrode 150 to control current flow through the 2DEG layer 115 . The gate electrode 150 is insulated from the N-doped AlGaN layer 120 by a thicker gate oxide layer 155 . To configure the HFET power device as a normally-off device, the floating gate 160 is formed under at least a portion of the gate oxide layer 155 . Floating gate 160 is insula...

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Abstract

A heterostructure field effect transistor (HFET) gallium nitride (GaN) semiconductor power device comprises a hetero-junction structure comprises a first semiconductor layer interfacing a second semiconductor layer of two different band gaps thus generating an interface layer as a two-dimensional electron gas (2DEG) layer. The power device further comprises a source electrode and a drain electrode disposed on two opposite sides of a gate electrode disposed on top of the hetero-junction structure for controlling a current flow between the source and drain electrodes in the 2DEG layer. The power device further includes a floating gate located between the gate electrode and hetero-junction structure, wherein the gate electrode is insulated from the floating gate with an insulation layer and wherein the floating gate is disposed above and padded with a thin insulation layer from the hetero-junction structure and wherein the floating gate is charged for continuously applying a voltage to the 2DEG layer to pinch off the current flowing in the 2DEG layer between the source and drain electrodes whereby the HFET semiconductor power device is a normally off device.

Description

technical field [0001] The invention mainly relates to a structure and a preparation method of a semiconductor power device. More precisely, the present invention relates to a gallium nitride (GaN)-based field effect transistor manufactured with a novel device structure and fabrication method, and the normally-off GaN-based field effect transistor has extremely high performance when conducting a large current. low on-resistance. Background technique [0002] Conventional methods of configuring and fabricating Gallium Nitride (GaN) based Field Effect Transistors (FETs) are still challenged by the technical problem of providing normally off FET transistors with facile fabrication and operational configurations. More specifically, Gallium Nitride (GaN) based FETs are configured to fabricate High Electron Mobility Transistors (HEMTs). For power transistor devices, this type of transistor can replace some of the now common and widely used silicon-based semiconductor power devic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/778H01L29/788H01L29/40H01L29/423H01L21/335H01L21/336
CPCH01L29/41725H01L29/7787H01L29/66462H01L29/402H01L29/1029H01L29/785H01L29/2003
Inventor 安荷·叭剌朱廷刚
Owner ALPHA & OMEGA SEMICON INT LP
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