Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Ku-wave band and ultra-narrow band micro band-pass filter with low loss and high inhibition

A low-loss, high-rejection technology, applied in the field of filters, can solve the problems of large volume and insertion loss, and cannot be used in applications, and achieve the effect of relatively small bandwidth, light weight, and high reliability

Inactive Publication Date: 2011-04-06
NANJING UNIV OF SCI & TECH
View PDF1 Cites 29 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Filters designed by conventional methods, such as hairpin filter structures, resonant cavity filter structures, and coaxial line filter structures, all have the disadvantages of large volume and insertion loss, and are often unusable for demanding applications

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ku-wave band and ultra-narrow band micro band-pass filter with low loss and high inhibition
  • Ku-wave band and ultra-narrow band micro band-pass filter with low loss and high inhibition
  • Ku-wave band and ultra-narrow band micro band-pass filter with low loss and high inhibition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0010] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0011] combine figure 1 , figure 2 , image 3 , the Ku-band ultra-narrow-band low-loss high-suppression micro-bandpass filter of the present invention includes a surface-mounted 50-ohm impedance input port P1, an input inductance L5, first-stage parallel resonance units L1, C1, and a first electromagnetic coupling circuit L12 , C12, the second-level parallel resonance unit L2, C2, the second electromagnetic coupling circuit L23, C23, the third-level parallel resonance unit L3, C3, the third electromagnetic coupling circuit L34, C34, the fourth-level parallel resonance unit L3, C3 , the fourth electromagnetic coupling circuit L14, C14, the output inductor L6, the surface-mounted 50 ohm impedance output port P2 and the ground terminal, the input port P1 is connected to the input inductor L5, the output port P2 is connected to the output inductor L6, and the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a Ku-wave band and ultra-narrow band micro band-pass filter with low loss and high inhibition, which comprises an input / output interface, four parallel resonant units, a Z-shaped cross coupling circuit and an input and output inductor, wherein the input / output interface is suitable for surface mounting; the four parallel resonant units are realized by adopting two layers of folded coupling strip lines; and the structures are realized by adopting a multi-layer low-temperature co-fired ceramic (LTCC) process technology. The invention has the advantages of good band-passselectivity, good out-of-band inhibition, low insert loss, light weight, small volume, high reliability, good electrical performance, good phase frequency characteristic linearity, good temperature stability, good electrical performance batch consistency, low cost and the like, can realize large batch production, and is especially suitable for wireless communication handheld and portable terminalproducts such as radars, communication terminals, rocket-borne terminals, air-borne terminals, missile-borne terminals, space ships, individual mobile communication terminals and the like, and corresponding frequency band systems with strict requirements on volume, weight, electrical performance, reliability and the like.

Description

technical field [0001] The invention relates to a filter, in particular to a Ku-band ultra-narrowband low-loss and high-suppression miniature bandpass filter. Background technique [0002] With the development of microwave and millimeter wave communication, radar and other systems, especially in mobile handheld wireless communication terminals, individual satellite mobile communication terminals, military and civilian multi-mode multi-channel communication system terminals, airborne, missile-borne, aerospace communication systems With the continuous miniaturization of microwave and millimeter wave communication modules, band-pass filters are the key electronic components in the receiving and transmitting branches of corresponding bands, and micro-wave band-pass filters with ultra-narrow band and high stop-band suppression are an important development direction. The main technical indicators describing the performance of this component are: passband operating frequency range,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H03H7/09
Inventor 戴永胜周聪徐利於秋杉郭永新盛卫星戴冰清杨健张红陈曦王立杰陈少波
Owner NANJING UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com