Preparation method of nanocrystalline silicon-aluminum oxide/silicon oxide thermoelectric film material
A technology of thermoelectric thin film and nanocrystalline silicon, which is applied in the field of materials, can solve the problems of complex preparation process, small thermoelectric figure of merit of materials, and hinder development, and achieve the effect of simple preparation method, rich content and low price
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Embodiment 1
[0023] Place a 1mm thick quartz glass substrate in 400mL of cleaning solution A mixed with hydrogen peroxide, 30% by mass percent ammonia, and deionized water at a volume ratio of 1:1:5. Use an ultrasonic generator with a power of 30W and a frequency of Clean with 30kHz ultrasonic waves at 60°C for 10 minutes, rinse with deionized water; then place in 400mL of cleaning solution B mixed with hydrogen peroxide, 30% by mass percentage of hydrochloric acid, and deionized water at a volume ratio of 1:1:5. Use an ultrasonic generator with a power of 30W and a frequency of 30kHz to clean at 60°C for 10 minutes, rinse with deionized water, and dry the cleaned quartz glass substrate with nitrogen.
[0024] 2. Vacuum evaporation aluminum film
[0025] Put the cleaned quartz glass substrate and the tungsten boat with aluminum rods with a purity of 99.999% into the vacuum chamber of the vacuum coating machine, and evacuate until the background vacuum degree of the vacuum chamber is 2×10 ...
Embodiment 2
[0039] Example 3
Embodiment 3
[0041] Example 4
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