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Preparation method of nanocrystalline silicon-aluminum oxide/silicon oxide thermoelectric film material

A technology of thermoelectric thin film and nanocrystalline silicon, which is applied in the field of materials, can solve the problems of complex preparation process, small thermoelectric figure of merit of materials, and hinder development, and achieve the effect of simple preparation method, rich content and low price

Inactive Publication Date: 2011-04-06
SHAANXI NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although thermoelectric materials have many of the advantages mentioned above, some materials contain toxic elements (such as Bi, Pb, As, Sb, P, etc.), some have low content on the earth, and some have complex preparation processes that require high temperatures, especially the thermoelectric figure of merit ( ZT) is small, the thermoelectric conversion efficiency is low, and the preparation process is not compatible with the current development trend of the microelectronics manufacturing industry, which hinders its further development in the field of "microscopic" refrigeration

Method used

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  • Preparation method of nanocrystalline silicon-aluminum oxide/silicon oxide thermoelectric film material
  • Preparation method of nanocrystalline silicon-aluminum oxide/silicon oxide thermoelectric film material
  • Preparation method of nanocrystalline silicon-aluminum oxide/silicon oxide thermoelectric film material

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Experimental program
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Embodiment 1

[0023] Place a 1mm thick quartz glass substrate in 400mL of cleaning solution A mixed with hydrogen peroxide, 30% by mass percent ammonia, and deionized water at a volume ratio of 1:1:5. Use an ultrasonic generator with a power of 30W and a frequency of Clean with 30kHz ultrasonic waves at 60°C for 10 minutes, rinse with deionized water; then place in 400mL of cleaning solution B mixed with hydrogen peroxide, 30% by mass percentage of hydrochloric acid, and deionized water at a volume ratio of 1:1:5. Use an ultrasonic generator with a power of 30W and a frequency of 30kHz to clean at 60°C for 10 minutes, rinse with deionized water, and dry the cleaned quartz glass substrate with nitrogen.

[0024] 2. Vacuum evaporation aluminum film

[0025] Put the cleaned quartz glass substrate and the tungsten boat with aluminum rods with a purity of 99.999% into the vacuum chamber of the vacuum coating machine, and evacuate until the background vacuum degree of the vacuum chamber is 2×10 ...

Embodiment 2

[0039] Example 3

Embodiment 3

[0041] Example 4

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Abstract

The invention discloses a preparation method of a nanocrystalline silicon-aluminum oxide / silicon oxide thermoelectric film material. The preparation method comprises the following steps: cleaning a quartz glass substrate, performing vacuum evaporation of an aluminum film and annealing. As the metal aluminum with relatively low cost is used as a thermal evaporation material, the resistivity and the Seebeck coefficient of the prepared nanocrystalline silicon-aluminum oxide / silicon oxide thermoelectric film material are as good as or better than those of the traditional thermoelectric film material. Compared with the traditional thermoelectric material and the preparation method thereof, the invention has the advantages of simple preparation method, relatively low temperature and low production cost, ensures no environmental pollution and can be popularized and applied in the production of preparing the nanocrystalline silicon-aluminum oxide / silicon oxide thermoelectric film material.

Description

technical field [0001] The invention belongs to the technical field of materials, and in particular relates to a thermoelectric material, in particular to a nanocrystalline silicon-alumina / silicon oxide thermoelectric film material. Background technique [0002] Thermoelectric materials are functional materials that can convert heat and electricity into each other. Existing thermoelectric materials include semiconductor alloy thermoelectric materials (such as Bi 2 Te 3 , PbTe, SiGe, etc.), cobaltate oxide thermoelectric materials (such as NaCo 2 o 4 , Ca 3 co 4 o 9 , Ca 3 co 2 o 6 etc.), metal alloy solid solution thermoelectric materials (such as AgTiTe, ZrNiSn, TiNiSn, etc.), metal silicide thermoelectric materials (such as FeSi 2 , MnSi 2 、CrSi 2 etc.), Skutterudite thermoelectric material (its general formula is AB 3 , A is a metal element, such as Ir, Co, Rh, Fe, etc., B is a group V element, such as As, Sb, P, etc., such as CoSb 3 ). [0003] Thermoelect...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/26C23C14/58C23C14/18
Inventor 高斐郝培风刘立慧
Owner SHAANXI NORMAL UNIV
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