Device and method for measuring damage of optical surface subsurface layer

A technology of measuring device and measuring method, which is applied in the direction of scattering characteristic measurement, etc., can solve the problems of small penetration depth, inapplicability, and unsuitability for quantitative detection, and achieve high signal-to-noise ratio, large longitudinal measurement range, and wide application range Effect

Active Publication Date: 2011-01-19
XIAN TECHNOLOGICAL UNIV
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Problems solved by technology

However, in the specific operation process, the laser confocal microscope is mainly used to measure the microscopic surface topography. Although the measurement light can penetrate deep into the sample, it is affected by the strong surface reflection light (Wang Chunhui, Tian Ailing, etc. use MIE scattering Theoretical studies on subsurface scattering show that the intensity of subsurface scattering signals on optical surfaces is about 3 to 4 orders of magnitude lower than that of surface reflected light (SPIE, 2009, 7522, 75226K1~75226K7), and subsurface responses are usually not available Signal
[0009] In addition, there are optical coherence tomography, photoacoustic microscopy, X-ray diffraction, etc., but these methods have relatively large limitations, for example, they are not suitable for amorphous optical glass, and the penetration depth is too small, so they are not suitable for quantitative analysis. detection etc.

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  • Device and method for measuring damage of optical surface subsurface layer
  • Device and method for measuring damage of optical surface subsurface layer
  • Device and method for measuring damage of optical surface subsurface layer

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Embodiment Construction

[0037] The invention will be described in detail below through specific embodiments.

[0038] One, see figure 1 , An optical surface subsurface damage measurement device: It includes a laser light source 1, a collimating beam expander 2 and a beam splitter 3 with a split ratio of 1:1. The collimating beam expander 2 and the beam splitter 3 are placed in the laser light source 1 in turn At the transmitting end, the collimating beam expander 2 is provided with a filtering pinhole 11 at the transmitting end. The receiving end condenser 10 and the pinhole photodetector 9 are arranged on the transmission side optical path of the beam splitter 3, and the X and Y two-dimensional electrically controlled planar scanning galvanometer 4 is arranged on the reflection side optical path of the beam splitter 3. Microscopic objective lens 5 and Z-direction piezoelectric micro-displacement scanning platform 6. The pinhole photodetector 9 is connected to the control display module 12 through the ...

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Abstract

The invention relates to a device and a method for measuring damage of an optical surface subsurface layer. During processing the conventional large-sized optical system or ultra-precise element surface, the measurement of optical surface subsurface layer damage is destructive to the surface of a component, and the limitation is high. The device comprises a laser light source, an alignment beam expansion mirror and a spectroscope, wherein a transmitting end filter pinhole is formed in the alignment beam expansion mirror; the transmission side light path of the spectroscope is provided with a receiving end condenser lens and a pinhole photoelectric detector, and the reflection side light path of the spectroscope is provided with an X and Y two-dimensional electric plane scanning galvanometer, a measurement microscope objective and a Z-directional piezoelectric micro displacement scanning platform; and the pinhole photoelectric detector is connected with a control display module through a signal processing and transmission module and a surface reflected light calculating and processing module, and the Z-directional piezoelectric micro displacement scanning platform is also connected with the control display module. The device can realize nondestructive and quantitative measurement, has larger longitudinal measurement range and strong adaptability, and is not limited by a processing technique.

Description

Technical field [0001] The invention relates to the technical field of non-destructive quantitative detection, in particular to an optical surface subsurface damage measurement device and a measurement method in the technical field of optical surface subsurface damage detection. Background technique [0002] The continuous in-depth development of large-scale solid-state laser engineering, high-performance laser weapons, high-precision optical systems, and micro-manufacturing processing has provided a huge impetus for the development of optical industry worldwide. Of course, while meeting this occasion, relevant practitioners in the optical field are also facing unprecedented challenges. Optical surface subsurface damage (SSD) measurement and processing of low-damage optical components is a difficult problem facing optical technology and optical ultra-precision measurement engineers at this stage. Because it is necessary to conduct a comprehensive and in-depth study on the surfac...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/47G01N21/49
Inventor 田爱玲王春慧王红军刘丙才
Owner XIAN TECHNOLOGICAL UNIV
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