High-reflectivity nano film layer for high-power LED lamps and film coating method thereof
A technology of LED lights and high reflectivity, which is applied in reflectors, sputtering coatings, coatings, etc., can solve problems such as low production efficiency, short oxidation resistance time, and low yield rate, and achieve strong environmental protection and excellent anti-corrosion Oxidation, the effect of improving product yield
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[0029] Example: High reflectivity nano film layer for high power LED lamps, containing Al 2 o 3 , Al and SiO 2 Three components, of which Al 2 o 3 Accounting for 5% to 10% of the total mass of the film, Al accounts for 80% to 85% of the total mass of the film, SiO 2 It accounts for 5% to 15% of the total mass of the film layer. The high-reflectivity nano-film layer is plated on the light-reflecting surface of the LED lamp using vacuum ion magnetron sputtering technology. The principle of vacuum ion magnetron sputtering technology is to use glow discharge (glow discharge) to hit argon (Ar) ions on the surface of the target (target), and the atoms of the target are ejected and accumulated on the surface of the substrate (that is, the light of the LED lamp). reflective surface) to form a thin film. The target input power and sputtering time of vacuum ion magnetron sputtering technology can be controlled, and it is easy to obtain high-precision film thickness.
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