Semiconductor apparatus and method for fabricating the same
A semiconductor and pocket area technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, transistors, etc., to achieve the effects of improving short channel effects, reducing leakage current, and improving performance
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[0017] The present invention relates to a method of manufacturing a semiconductor device, in particular to a method of manufacturing a semiconductor device that improves device performance and / or improves control of short channel effects. The manner in which various embodiments can be made and used is described in detail below. However, it should be noted that the various applicable inventive concepts provided by the present invention are implemented according to various changes in the specific context, and the specific embodiments discussed here are only used to show the specific use and manufacture The method of the present invention is not intended to limit the scope of the present invention. The following is a description of the manufacturing process of the preferred embodiment of the present invention through various drawings and examples. In the various and various embodiments of the invention and in the drawings, the same reference numerals represent the same or simila...
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