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Photosensitive resin composition and method for producing same

A technology of photosensitive resin and manufacturing method, which is applied in the field of photosensitive resin composition to achieve the effects of good thermal stability and good developing latitude

Active Publication Date: 2013-05-15
RESONAC CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is not preferable to use a chromium compound such as chromium naphthenate as a synthesis catalyst from the standpoint of the current awareness of environmental issues and / or the complexity of waste liquid treatment after development.

Method used

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  • Photosensitive resin composition and method for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0040] Hereinafter, the present invention will be described in more detail through examples, but the present invention is not limited to these examples.

Synthetic example 1

[0042] In the flask with stirrer, gas introduction pipe and reflux tube, add 192 parts by mass of ethyl carbitol acetate, dissolve 206 parts by mass (1 equivalent) of cresol novolak type epoxy resin (dongdu) therein Epoto-to (registered trademark) YDCN704 manufactured by Kasei Co., Ltd., epoxy equivalent 206). Further add 72 parts by mass (1.0 mole) of acrylic acid, 0.23 parts by mass of hydroquinone, 0.4 parts by mass of triphenylphosphine and 2 parts by mass of zirconium naphthenate (6% metal content), and blow into The reaction was continued at 130° C. for 10 hours while air was released, and a reactant (epoxy acrylate) having an acid value of 0.5 mgKOH / g was obtained. 76.0 parts by mass (0.5 mol) of tetrahydrophthalic anhydride was added there, and it was further reacted at 120° C. for 2 hours to obtain a reactant having a solid content acid value of 79.3 mgKOH / g. Ethyl carbitol acetate was added thereto so that the non-volatile matter would be 60%, and photosensitive res...

Synthetic example 2

[0044] Except using 2 parts by mass of zirconium octoate (12% of metal content) instead of 2 parts by mass of chromium naphthenate (6% of metal content), the same operation as Synthesis Example 1 was carried out to obtain a solid content acid value of 79.3 mgKOH / g reactants. Ethyl carbitol acetate was added thereto so that the non-volatile matter would be 60%, and photosensitive resin B was obtained.

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Abstract

The invention provides a photosensitive resin composition, which contains no chromium compound such as chromium naphthenate and the like, and has the thermal stability and developing latitude over those by taking a chromium compound as a synthesis catalyst. The photosensitive resin composition is characterized in that the photosensitive resin composition contains (A) a photosensitive resin, (B) an epoxy resin, (C) a photopolymerisable initiator and (D) reactivity diluent, wherein, the (A) photosensitive resin is obtained by reacting, in the presence of a trivalent organic phosphor compound and at least one of chromium naphthenate and zirconium caprylate of at least four times of the trivalent organic phosphor compound basen on the mass reference, a multifunctional epoxide with an unsaturated unitary acid and reacting the product with a polyanhydride.

Description

technical field [0001] The present invention relates to a photosensitive resin composition. More specifically, it relates to a photosensitive resin composition which does not contain chromium compound, has high sensitivity to ultraviolet light exposure, has good physical properties of the obtained coating film, and can be developed with dilute alkali. Background technique [0002] In recent years, dilute alkali-developable liquid photo-solder resist inks have been widely used as solder resist inks for various printed wiring boards. As a photosensitive resin of a dilute alkali developing type, the acid-pendant type epoxy acrylate resin obtained by making the hydroxyl group of an epoxy acrylate resin react with an acid anhydride is known, for example. As the synthesis catalyst of this acid side group type epoxy acrylate resin, for example, in Patent Document 1, it is proposed to use carboxylate metal salts such as lithium naphthenate, chromium naphthenate, zirconium naphthenat...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/038C08G59/68C08G59/42C08G59/17
Inventor 上井浩志荻原和重
Owner RESONAC CORPORATION
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