Two-degree of freedom precise positioning work table

Abstract

The invention discloses a two-degree of freedom precise positioning work table, which comprises a base, a moving platform, a rigid support which is connected with the bottom of the base, and four flexible branched chains which are connected between the moving platform and the base, wherein each flexible branched chain comprises a moving block and three groups of flexible plate spring structures; each flexible plate spring structure consists of two '-'-shaped flexible plate springs; a first group and a second group of the flexible plate spring structures are respectively positioned at the left side and the right side of the moving block; the lower ends of the two '-'-shaped flexible plate springs of a third group of the flexible plate spring structures are connected with the side wall of the upper end of the moving block, and the upper ends thereof are connected with the side wall of the moving platform; four piezoelectric ceramics driving devices are respectively horizontally arranged; a ball-shaped joint of each driving device is supported on the side wall of the lower end of the moving block; and conducting strips of two position sensors are respectively connected with the upper plane of the rigid support and the lower plane of the moving platform. The positioning work table can be taken as an auxiliary positioning platform of a nanometer embossing photoetching positioning system to realize the microscale feeding and the precise positioning.

Description

technical field [0001] The invention belongs to a micro-operating system, in particular to a two-degree-of-freedom flexible parallel precision positioning worktable which can be applied to an imprint lithography system. Background technique [0002] Nanodevices include nanoelectronic devices and nanophotoelectric devices, which can be widely used in electronics, optics, micromechanical devices, new computers, etc. , intelligent, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nanodevices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices are in a period of rapid development. There are various methods, and patterning technology is one of them. [0003] Nanoimprint lithography is a patterning technique developed in the proces...

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality

Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process

The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

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