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Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method

A technology of light beam conversion and optical elements, which is applied in exposure devices, optical elements, and microlithography exposure equipment in photolithography, can solve the problems of low light flux and light loss in exposure devices, and achieve the goal of suppressing light loss and high productivity Effect

Inactive Publication Date: 2009-02-18
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As a result, in the conventional technology, a large amount of light loss occurs at the aperture aperture, causing an unsuitable phenomenon that the light flux of the exposure device is reduced.

Method used

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  • Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method
  • Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method
  • Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method

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Embodiment Construction

[0070] Hereinafter, embodiments of the present invention will be described based on the drawings.

[0071] FIG. 1 shows a schematic diagram of the structure of an exposure apparatus equipped with an optical illumination device according to an embodiment of the present invention. In FIG. 1, the normal direction of the wafer W as a photosensitive substrate is set as the Z axis, and the direction parallel to the paper surface of FIG. 1 in the plane of the wafer W is set as the Y axis. The vertical direction of the paper in Figure 1 is the X axis. The exposure apparatus of this embodiment is provided with a light source 1 to supply light (illumination light) for exposure.

[0072] As the light source 1, for example, a KrF excimer laser (Excimer Laser) light source that supplies light with a wavelength of 248 nm, or an ArF excimer laser light source that supplies light with a wavelength of 193 nm can be used. The approximately parallel light beams emitted from the light source 1 in the...

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Abstract

A lighting optical device capable of forming a bracelet-form lighting pupil distribution in a peripherally-polarized state with a light quantity loss satisfactorily controlled, the device comprising a light flux conversion element (50) for forming a bracelet-form light intensity distribution on a specified surface based on an incident light flux. The light flux conversion element comprises a first basic element (50A) formed of an optically-rotating optical material, for forming a first arcuate area distribution based on an incident light flux out of bracelet-form light intensity distribution, a second basic element (50B) for forming a second arcuate area distribution, a third basic element (50C) for forming a third arcuate area distribution, and fourth basic element (50D) for forming a fourth arcuate area distribution. Respective basic elements have mutually different thicknesses along the light transmitting direction.

Description

[0001] This application is a division of the original application No. 200480034124.6 (International Application No. PCT / JP2004 / 016247, International Application Date November 2, 2004), and the title of the invention is "beam conversion element, optical lighting device, exposure device and exposure method" Application. Technical field [0002] The present invention relates to a beam conversion element, an optical lighting device, an exposure device, and an exposure method, and in particular to the use of micro-elements such as semiconductor elements, photographic element liquid crystal display elements, thin-film magnetic heads, etc. by photolithography etching process Optical lighting device suitable for exposure device. Background technique [0003] In such a typical exposure device, the light beam emitted from the light source passes through an optical integrator and a fly-eye lens, and a substantial number of light sources form a secondary light source of a surface light source...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/28G02B5/18G02B27/44G02B27/00G03F7/20G02B19/00H01L21/027
CPCG02B27/28G02B27/4233G03F7/70158G02B5/3025G02B27/4261G02B27/44G03F7/70566H01L21/027G02B27/0927G02B27/0944G03F7/70091G03F7/70108
Inventor 豊田光纪
Owner NIKON CORP
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