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Hard film containing stress relaxation layer and method for preparing the same

A hard and thin-film technology, applied in coating, solid-state diffusion coating, metal material coating process, etc., can solve the problems of high internal stress, metal substrate surface shedding, etc., and achieve the effect of alleviating internal stress

Inactive Publication Date: 2008-12-17
SOUTHWEST UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The object of the present invention is to provide a kind of hard thin film containing stress relief layer and preparation method thereof, the method can fully relieve the internal stress of the hard thin film with a thickness of more than 10um (5um for TiN thin film), to tens of um, At the same time, a thicker hard film can also be obtained by using a method such as ion plating technology with limited raw materials for film deposition. The hard film obtained by this method contains multiple stress relaxation layers, thereby solving the problem of the thickness of the traditional hard coating. When the thickness exceeds 10um, it is easy to fall off from the surface of the metal substrate due to excessive internal stress

Method used

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  • Hard film containing stress relaxation layer and method for preparing the same
  • Hard film containing stress relaxation layer and method for preparing the same
  • Hard film containing stress relaxation layer and method for preparing the same

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Embodiment 1

[0025] The coating equipment used is arc ion coating equipment, with a total of 6 cathodes, all of which use Cr as the cathode target, and the atmosphere gas is nitrogen and argon. Firstly, a Cr layer is deposited on the iron-based substrate, and then a CrN film is deposited on it. When depositing a CrN film, first electrify the Cr cathode in a nitrogen atmosphere to evaporate and ionize Cr for 60 minutes, then change the nitrogen to argon, and electrify the Cr cathode in an argon atmosphere to evaporate and ionize. The time is 2min, and finally the argon gas is changed to nitrogen gas, and CrN is deposited in the nitrogen atmosphere gas for 60min, and this is repeated several times to obtain a CrN thick film with a Cr metal stress relaxation layer.

[0026] After observation by transmission electron microscope, it was found that the above method obtained such figure 1 The CrN thin film with the multilayer structure shown, that is, a 5-layer structure in which every 4um thick...

Embodiment 2

[0029] Adopt the same method as embodiment 1 to obtain CrN / Cr / CrN multilayer film, multilayer film deposition time is respectively CrN45min, Cr2min, CrN45min, Cr2min, CrN45min, Cr2min, CrN45min, has formed like this after every 3umCrN layer on the bottom layer One layer of 30nmCr layer, the total thickness is also a 7-layer structure thick film of 12um. The measured internal stress was -1.3 GPa.

Embodiment 3

[0031] Adopt the method same as embodiment 1 to obtain CrN / Cr / CrN multilayer film, multilayer film deposition time is respectively CrN36min, Cr2min, CrN36min, Cr2min, CrN36min, Cr2min, CrN36min, has formed every 2.4umCrN layer on the bottom layer like this The latter layer is a 30nmCr layer, and the total thickness is also a 9-layer structure thick film of 12um. The measured internal stress was -1.4GPa.

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Abstract

The invention discloses a hard film containing a stress buffer layer and a preparation method thereof. Internal stress of film can be decreased through adding a multilayer structure formed by the same mental layer with certain thickness at regular intervals into the film of metal nitrides, so as to prevent the film from dropping out of matrix. The multilayer film is formed through two processes of nitride deposition and metal-layer deposition which are carried out repeatedly and alternatively. The method of the invention can solve the problem that the traditional hard coating is easy to drop out of metal matrix due to high internal stress when the thickness of the traditional hard coating exceeds 10um.

Description

technical field [0001] The invention relates to the field of new materials, in particular to a hard film containing a stress relaxation layer and a preparation method thereof when applied to the surface strengthening treatment of friction pair parts such as tools, molds and auto parts. Background technique [0002] The study of increasing the wear resistance and life of the friction pair parts by depositing a hard coating on the surface has been published. There are also some patented technologies in this area. Development of Phase Hybrid Thin Films. Some other patents record the nanocomposite thin film technology represented by CrSiN and TiSiN. [0003] However, for these hard films, when the thickness exceeds 10um, the internal stress of the film will become very large, causing the film to peel off. Especially for the film obtained by ion plating technology, when the film thickness is 2-3um, there is no problem. However, when the film thickness exceeds 10um, the internal...

Claims

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Application Information

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IPC IPC(8): C23C14/06C23C14/24C23C8/24
Inventor 聂朝胤田鹏曲燕青张碧云
Owner SOUTHWEST UNIVERSITY
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