Low-light matt film and preparation thereof
A matting film and matting agent technology, applied in the field of low-gloss matting film, can solve the problems of loss of material strength film surface gloss, mechanical properties of low-gloss matting film and many bright spots in the film, and achieve high strength, good hand feeling, and few bright spots. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1~3
[0026]
[0027]
[0028] The performance test is as follows:
[0029]
Embodiment 4
[0031] A preparation method of a low light matting film, comprising the following process steps: 40 kg of polypropylene resin, 10 kg of antistatic agent erucamide, 10 kg of antiblocking agent silicon dioxide, 40 kg of matting masterbatch, the matting masterbatch is containing matting agent 65wt% polypropylene resin, after mixing and metering, undergoes physical and chemical reactions through a single-screw extruder at 200°C, longitudinal stretching, transverse stretching and traction, and then biaxially stretches to obtain a product.
Embodiment 5
[0033] A method for preparing a low-gloss matting film, comprising the following process steps: 90 kg of polypropylene resin, 1 kg of antistatic agent ethoxylamine, 1 kg of anti-blocking agent silicone, 8 kg of matting masterbatch, the matting masterbatch is containing matting agent 65wt% polypropylene resin, after mixing and metering, undergoes physical and chemical reactions through a single-screw extruder at 270°C, longitudinal stretching, transverse stretching and traction, and then biaxially stretches to obtain a product.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com