Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for producing structure

A technology for components and supporting components, which can be used in photosensitive materials for opto-mechanical equipment, 3-dimensional image production, photoengraving of pattern surfaces, etc., and can solve problems such as difficult production.

Inactive Publication Date: 2008-09-17
FUJITSU LTD
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is difficult to simply fabricate structures made of photoreactive resins, such as microstructured devices with through-hole patterns

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for producing structure
  • Method for producing structure
  • Method for producing structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] A method for fabricating a structure according to an embodiment of the present invention will be described below with reference to the accompanying drawings. figure 1 Steps in the fabrication method are shown.

[0030] A hot water soluble sheet 10 is formed (step 1100). The hot water soluble sheet member 10 is a hot water soluble sheet member and is composed of agar or polyvinyl alcohol resin. These materials are also environmentally friendly. Agar is soluble in hot water at a temperature of about 50 degrees Celsius or higher. Polyvinyl alcohol resin is soluble in hot water at a temperature of about 80 degrees Celsius or higher. The size and shape of the hot water soluble sheet member 10 are not particularly limited.

[0031] The photoreactive resin 20 is coated on the hot water soluble sheet 10 (step 1200). Examples of photoreactive resins that can be used include, but are not limited to: polyvinylcinnamate, cyclized polyisoprene-bisazide, novolac resin, fluorocar...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

According to the present invention, a method is provided for manufacturing a structure composed of a photoreactive resin comprising the steps of: forming the photoreactive resin on a sheet member soluble in water; exposing the photoreactive resin selectively to a radiation activating the photoreactivity to produce the structure; and dissolving the sheet member in water after the exposing step.

Description

technical field [0001] The present invention relates to methods for fabricating structures made of photoreactive or photocurable resins. This photoreactive resin (photosensitive resin) is generally called a resist and is developed. The photocurable resin is used in stereolithography technology. What these resins have in common is that light is used to achieve at least a photoreaction. Unless otherwise specified, these resins are referred to as "photoreactive resins" in this specification. Background technique [0002] Demand for microstructures such as bio-elements and optical devices composed of photoreactive resins is increasing today. The application of photolithography (exposure) in which a mask pattern is transferred to a resin and nanoimprint technology in which a mold pattern is transferred has been conceived for making microstructures. However, photolithography is a technique in which, after exposure, a pattern is transferred to a substrate under a photoreactive ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G03F7/20G03F7/30
CPCG03F7/40G03F7/09G03F7/0037G03F7/11
Inventor 松下直久饭田进
Owner FUJITSU LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com