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Kitchen garbage drying processor

A coating device and coating technology are applied in the direction of the device for coating liquid on the surface, the optical filter, the photographic plate-making process of the patterned surface, etc., which can solve the problems of time (longer production cycle time, liquid breakage, etc., Achieve the effect of reducing the implementation precision and shortening the production cycle time

Inactive Publication Date: 2008-07-16
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the size of the substrate increases, the time required for one batch of coating (tact time) will also increase, and even if the coating speed is increased to shorten the tact time, there is also the problem of the above-mentioned liquid cut-off.

Method used

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  • Kitchen garbage drying processor
  • Kitchen garbage drying processor
  • Kitchen garbage drying processor

Examples

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Effect test

Embodiment

[0165] The present invention will be described in more detail based on examples, but the present invention is not limited thereto.

[0166] (1) Preparation of black (K) resist

[0167] The black (K) resist can be obtained as follows, that is: first weigh K pigment dispersion 1 and MMPGAC in the amount recorded in Table 1, mix at a temperature of 24°C (±2°C), and stir at 150rpm for 10 Minutes, then, measure the amount of methyl ethyl ketone, ethylene glycol monobutyl ether acetate (BMGAC), adhesive 2, hydroquinone monomethyl ether, DPHA liquid, 2,4 -Bis(trichloromethyl)-6-[4'-(N,N-bisdiethoxycarbonylmethyl)amino-3'-bromophenyl]-s-triazine, Surfactant 1, in Add sequentially at a temperature of 25°C (±2°C), and stir at a temperature of 40°C (±2°C) at 150 rpm for 30 minutes. In addition, the quantity shown in Table 1 is a mass part. In addition, the composition of each material described in Table 1 is as follows.

[0168] [Table 1]

[0169] Black (K) photocurable com...

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Abstract

The invention provides a gap coating method which is a method for fixing the base plate, moving the coating head, wherein the coating liquid is coated uniformly and stably on the surface of the base plate free from the affect of the surface condition of the base plate even in a high coating speed. The gap coating method is characterized in that: the coating liquid flows out from the gap front of the coating head to form a weld pass of the coating liquid in the gap between the coating head and the surface of the even surface, and the coating head moves ahead, and, by aid of the weld pass, the coating liquid is coated on the surface of the base plate, wherein the method comprises: a holding process for embeding and holding the base plate in the groove of the worktable to make the base plate and the worktable become in a same surface; and a decompressing process for moving the coating head from one end of the base plate to the other one to coat the coating liquid, and decompressing the front in the moving direction of the coating head of the weld pass by using the decompressing chamber moving together with the coating head.

Description

technical field [0001] The present invention relates to a slit coating method and device, and a manufacturing method of a color filter, and in particular to a method for coating each film in a uniform thin film state on a substrate or a semiconductor wafer used in an image display device such as a liquid crystal display or a plasma display. A technique for coating liquids. Background technique [0002] In recent years, the demand for optical films has been increasing. Such an optical film includes, for example, a color filter used as a display portion of various image display devices. When manufacturing color filters, various coatings such as color resists, resists for black matrix, resists for alignment control protrusions, and other photoresist solutions are applied to a flat transparent substrate made of glass or the like. As the coating method, a slot coating coating method, a spin coating coating method, or the like is used. [0003] For example, the gap coating coat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05D1/26B05D7/24B05C5/02B05C11/10B05C13/02G03F7/00G02B5/20
CPCB41M3/003G02B5/201G02F1/133516H01L27/14621
Inventor 田中光利
Owner FUJIFILM CORP
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