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Magnetic-control sputtering coiling film coating machine

A technology of magnetron sputtering and coating machine, which is applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc. It can solve unfavorable economical operation of vacuum pump, large amount of gas outgassing, and inability to adapt to winding coating machine, etc. problems, to achieve the effect of smooth surface, low equipment cost, and dense surface microstructure

Active Publication Date: 2008-06-04
SICHUAN GOLDSTONE-ORIENT NEW MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Coating a functional film on a plastic film usually adopts a winding coating method, and to coat a functional film with a better function on a plastic film, such as a low-reflection film (Low-E film) with a better function on a polyester film, at least Plating double-silver structure film means to coat more than 9 layers of film layers. If plating an electromagnetic shielding film (EMI film) with a visible light transmittance greater than 85% and a resistance of less than 1Ω / □, it is necessary to plate a four-silver structure, that is, 17 layers of film layers. , each layer of film needs to be equipped with a set of cathodes and target cores, while the traditional roll-to-roll coating machine adopts single-roller integral coating, which not only places a cold rod, 2-3 cathodes, target cores and Coil unwinding mechanism and winding mechanism, due to structural limitations, cannot arrange more than 4 sets of cathodes on the circumference, and cannot adapt to one plating process to plate more than 4 layers of films with different functions or materials. Two cold rods, 4-6 cathodes and target cores are placed in a coating vacuum chamber, and there are no less than 17 cathodes and target positions, which cannot achieve the purpose of coating 17 layers of films. If the traditional design is used, at least 3 A cooling roll requires a too large vacuum box and the cathode and target core are all in the vacuum box. There are many pipelines for water and electricity, and the amount of gas produced is too large, which is not conducive to the economical operation of the vacuum pump. If this kind of coating machine is to be used The coating speed is increased to more than 3 m / min, and the number of cathodes that can become qualified films in one pass will exceed more than 20. It is also necessary to consider the structural design of multiple cooling rolls and the convenience of maintenance, saving the power of multiple vacuum pumps. Therefore, the traditional roll-to-roll plating machine cannot adapt to one plating process and can plate more than 4 layers of films with different functions or materials, and cannot produce functional plastic films with many layers and better functions.

Method used

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  • Magnetic-control sputtering coiling film coating machine
  • Magnetic-control sputtering coiling film coating machine
  • Magnetic-control sputtering coiling film coating machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Fig. 1~Fig. 3 has provided the figure of embodiment 1 of the present invention. Referring to Fig. 1~Fig. 3, the structure diagram of magnetron sputtering roll-to-roll coating machine of the present invention, there is unwinding vacuum chamber 1 in the roll-to-roll coating machine of the present invention, is positioned at the opening that is used for changing coil material on the unwinding vacuum air wall Door 2, the unwinding machine located in the unwinding vacuum chamber 3, the film balance tension control system composed of several tension rollers in cooperation with the unwinding machine 30, the purchased film edge controller 32, the plastic film to be plated 4, Plated plastic film finished product 27, two coating vacuum chambers 5, two cooling rollers for cooling the film 6, twelve cathode flange connection seats 7, two vacuum coating boxes 31, vacuum connection box 8, for vacuuming Slide valve pump 9, Roots pump 10, molecular pump 11 for pumping high vacuum, stri...

Embodiment 2

[0025] Fig. 4 has provided the figure of embodiment 2 of the present invention. The structure of this embodiment 2 is basically the same as that of embodiment 1, except that two unwinding machines 3 are set in the unwinding vacuum chamber 1, and an automatic film splicing mechanism 31 is provided, which increases the speed of splicing the film and improves the production efficiency.

Embodiment 3

[0027] Fig. 1 and Fig. 5 have provided the figure of embodiment 3 of the present invention. The structure of Embodiment 3 is basically the same as that of Embodiment 1. The difference is that the cooling roller 6 is not powered to rotate, but is driven by the winder 14. The plastic film 4 is close to the cooling roller 6 to drive its rotation, reducing the transmission mechanism. , reduce equipment cost.

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Abstract

The invention provides a magnetron sputtering winding coating equipment which at least comprises a vacuum chamber of a coil unwinding mechanism and / or a vacuum chamber of a winding mechanism, at least one coating vacuum chamber, and a vacuum connecting box used to be connected with a winding vacuum chamber, a unwinding vacuum chamber and coating vacuum chambers. The invention is characterized in that: the interior of at least one coating vacuum chamber is provided with a vacuum coating box, at least three groups of vacuum extraction systems consisting of cathodes, high / low pressure vacuum pumps and pipes are arranged around a cooling roll positioned in the vacuum coating box, the targets and the target centers of the cathodes of the magnetron sputtering are arranged in each vacuum coating box, the cathodes are arranged on the walls of the vacuum coating boxes through cathode flange connecting bases in a form of flange connection, gas connecting pipes and power supply connecting pipes as well as cooling water connecting pipes are arranged outside the vacuum coating boxes, gas baffles arranged among each group of cathodes isolate the gap between the shell of the vacuum coating box and the cooling roll into bleed-off passages. The coating equipment of the invention can make a multi-layer coating on the surface of plastic film; and the obtained coating has compact surface microscopic structure and smooth surface.

Description

Technical field: [0001] The invention relates to a magnetron sputtering winding coating machine, in particular to a magnetron sputtering winding coating machine with a plurality of cooling rollers and a plurality of coating vacuum chambers. Background technique: [0002] Coating a functional film on a plastic film usually adopts a winding coating method, and to coat a functional film with a better function on a plastic film, such as a low-reflection film (Low-E film) with a better function on a polyester film, at least Plating double-silver structure film means to coat more than 9 layers of film layers. If plating an electromagnetic shielding film (EMI film) with a visible light transmittance greater than 85% and a resistance of less than 1Ω / □, it is necessary to plate a four-silver structure, that is, 17 layers of film layers. , each layer of film needs to be equipped with a set of cathodes and target cores, while the traditional roll-to-roll coating machine adopts single-r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/56C23C14/02C23C14/12
Inventor 甘国工
Owner SICHUAN GOLDSTONE-ORIENT NEW MATERIAL TECH CO LTD
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