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Bidirectional micro-inertia sensor and production method thereof

A technology of micro-inertial sensors and mass blocks, which is applied in the direction of instruments, microstructure technology, microstructure devices, etc., can solve the problems of high air pressure film damping noise, non-linear test signal voltage, and affecting device performance, etc., to improve the yield , Increase the test signal voltage, improve the effect of sensitivity and resolution

Inactive Publication Date: 2008-05-07
HANGZHOU DIANZI UNIV
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AI Technical Summary

Problems solved by technology

For a general comb-shaped capacitive sensor, the nonlinear electrostatic force generated by the increase of the test signal voltage has a significant impact on the linearity and range of the sensor, thus affecting the performance of the device.
Some bidirectional (X-Y) sensitive inertial sensors use the method of inertial combination of two unidirectional devices, which is prone to errors when combined; some use the characteristics of silicon crystals to process inclined support beams to achieve bidirectional Sensitive purposes, but this method of air pressure film damping noise is large, and the test signal voltage is prone to nonlinearity

Method used

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  • Bidirectional micro-inertia sensor and production method thereof
  • Bidirectional micro-inertia sensor and production method thereof

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Embodiment Construction

[0025] The following examples illustrate the substantive features and remarkable progress of the ultra-high-resolution bidirectional micro-inertial sensor with fully symmetrical structure and its manufacturing method, but the present invention is by no means limited to the examples described.

[0026] The embodiment of the present invention relates to a bidirectional micro-inertial sensor, which will be described with reference to accompanying drawings 1 and 2 . As shown in Figure 1, differential detection capacitive electrodes 12, 13 in the X and Y directions are formed on the substrate, the external connection anchor point 1 of the movable mass, and the damping comb teeth and the aluminum connection lead 2 of the mass block are formed in the X and Y directions. The aluminum connection wires 3 between the respective connecting electrodes on the top, and the external connection anchor points 4-11 of the differential detection electrodes in the X and Y directions. As shown in F...

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Abstract

The invention relates to a dual-way micro-inertia sensor with complete symmetrical structure and ultra-high resolution, comprising a glass base, a fixed electrode with fixed gate shaped strip on the glass base, four silicon anchor points fixed on the glass base, and a dual-way micro-inertia sensor with complete symmetrical structure and ultra-high resolution composed of silicon mass blocks hung above the glass base. The silicon mass block is composed of eight gate shaped strips in X direction, eight gate shaped strips in Y direction, small rectangle mass blocks connected with each gate shaped module, a damping comb used to control the damping, four U shaped breast beams with anchor point connected with the mass block and a connecting beam of the mass block and the breast beam. The invention has the advantages that the performances in X-Y directions are completely consistent, the voltage of the testing signal is enlarged, and the sensitivity and resolution are improved, the air damping appears a slide-film damping during the detection of the differential movement between the polar plates of the capacitor, so that the Brown noise caused by the air damping is reduced.

Description

technical field [0001] The invention belongs to the field of microelectronic machinery manufacturing, and in particular relates to a bidirectional micro-inertial sensor with ultra-high resolution and completely symmetrical structure, and a manufacturing and processing method of the sensor. Background technique [0002] In recent ten years, accelerometers made with micromechanical technology have been developed rapidly. Its main acceleration detection technologies include piezoresistive detection, piezoelectric detection, thermal detection, resonance detection, electromagnetic detection, light detection, tunnel current detection and capacitance detection. In addition, there are accelerometers based on other detection technologies, such as optical accelerometers, electromagnetic accelerometers, and capacitive accelerometers. The development of optical accelerometers is mainly to combine the advantages of light and micromechanics to make sensors with high electromagnetic shiel...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01P15/125B81B7/02B81C1/00
CPCG01P2015/082
Inventor 董林玺颜海霞孙玲玲
Owner HANGZHOU DIANZI UNIV
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