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Optical multilayer filter, method for manufacturing the same, and electronic apparatus

A technology of optical multilayer film and manufacturing method, which is applied in the direction of optics, optical components, and optical filters for photography, and can solve the problems of unfavorable cost and changing the optical characteristics of optical multilayer film filters, etc.

Inactive Publication Date: 2007-10-10
SEIKO EPSON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, in an optical multilayer film filter in which the optical properties of the film constituting the outermost layer of the multilayer film are very important, if the transparent conductive film described in Patent Document 1 is provided on the outermost layer, the optical multilayer film may be changed. Optical properties of the filter itself
Furthermore, it is also disadvantageous in terms of cost when the transparent conductive film is provided in another step independently of the manufacturing step of the optical multilayer film filter.

Method used

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  • Optical multilayer filter, method for manufacturing the same, and electronic apparatus
  • Optical multilayer filter, method for manufacturing the same, and electronic apparatus
  • Optical multilayer filter, method for manufacturing the same, and electronic apparatus

Examples

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Embodiment 1～7、 comparative example 1～7

[0037] The present embodiment is an example suitable for an optical multilayer film filter (UV-IR cut filter) which passes the visible wave band and has an ultraviolet band below a predetermined wavelength and an ultraviolet wave band above a predetermined wavelength. Good reflective properties with less light absorption in the infrared band.

[0038] (Structure of optical multilayer film filter)

[0039] FIG. 1 is a cross-sectional view schematically showing the structure of an optical multilayer film filter 10 of the present invention. The optical multilayer film filter 10 is configured to include: a glass substrate 1 for transmitting light; and a multilayer inorganic thin film 2 formed on the upper surface of the glass substrate 1 .

[0040] The glass substrate 1 is white glass (refractive index n=1.52), and a glass substrate with a diameter of 30 mm and a thickness of 0.3 mm is used in this embodiment.

[0041] For the material of the inorganic thin film 2, the high refr...

Embodiment 8

[0101] Next, an electronic device configured including the optical multilayer film filter 10 of Examples 1 to 7 will be described. The present embodiment is an embodiment applied as an electronic device to, for example, an imaging device of a digital still camera that captures still images.

[0102] FIG. 6 is an explanatory diagram showing an example of the configuration of an electronic device according to the present invention, and shows a configuration example of the camera module 100 and the camera device 400 including the camera module 100 . The imaging module 100 shown in FIG. 6 is configured to include: an optical multilayer film filter 10, an optical low-pass filter 110, a CCD (charge-coupled device) 120 of an imaging element that electrically converts an optical image, and a device that drives the imaging element 120. The drive unit 130.

[0103] The optical multilayer film filter 10 is composed of a glass substrate 1 and an inorganic thin film 2 as described in an e...

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Abstract

An optical multilayer filter comprises a substrate, and an inorganic thin film that is composed of a plurality of layers and formed on the substrate. An uppermost surface layer of the inorganic thin film is a silicon oxide layer having a density of from 1.9 g / cm<3 >to 2.2 g / cm<3>.

Description

technical field [0001] The present invention relates to an optical multilayer film filter, a method for manufacturing the optical multilayer film filter, and an electronic device equipped with the optical multilayer film filter. Background technique [0002] Generally, optical multilayer film filters, such as antireflection film, half mirror, and low-pass filter, which are often used in electronic equipment, are composed of a substrate and an inorganic thin film formed on the substrate by evaporation or the like. . And, the inorganic thin film is usually formed from titanium oxide (TiO 2 ) and other high refractive index films and silicon oxide (SiO 2 ) and other low-refractive-index films are stacked alternately in a multilayer structure. [0003] However, since this inorganic thin film has no electrical conductivity in structure, it is easily charged with static electricity. Therefore, dust tends to adhere to the surface of the optical multilayer film filter, which adv...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/10G02B1/11G02B5/20G03B11/04G02B1/16
Inventor 澁谷宗裕
Owner SEIKO EPSON CORP
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