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Substrate-placing platform, substrate processing device and production method of substrate-placing platform

A technology of substrate processing device and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, ion implantation plating, gaseous chemical plating, etc., can solve the problems such as the method of processing the surface of the platform base that is not shown, and prevent uneven etching Effect

Active Publication Date: 2008-08-13
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, in the above-mentioned Patent Document 4, it is also proposed to provide a table portion on the peripheral portion of the base, but details about the shape of the table portion or the processing method of the base surface including the table portion are not shown.

Method used

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  • Substrate-placing platform, substrate processing device and production method of substrate-placing platform
  • Substrate-placing platform, substrate processing device and production method of substrate-placing platform
  • Substrate-placing platform, substrate processing device and production method of substrate-placing platform

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Embodiment Construction

[0091] Next, preferred embodiments of the present invention will be described with reference to the drawings. 1 is a cross-sectional view showing a plasma etching apparatus as an example of a processing apparatus provided with a susceptor as a substrate mounting table according to an embodiment of the present invention. This plasma etching apparatus 1 is a cross-sectional view of an apparatus for performing predetermined processing of the glass substrate G for FPD, and is configured as a capacitively coupled parallel plate plasma etching apparatus. Here, examples of the FPD include a liquid crystal display (LCD), a light emitting diode (LED) display, an electroluminescence (Electro Luminescence; EL) display, a fluorescent display tube (Vacuum Fluorescenl Display; VFD), a plasma display panel (PDP), and the like. . In addition, the processing apparatus of this invention is not limited to a plasma etching apparatus.

[0092] This plasma etching apparatus 1 has a rectangular cy...

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Abstract

The present invention provides one kind of base board supporting stage with homogeneous etching and its making process. The base board supporting stage for base board treating device possesses one stage body, raised parts formed on the base plane of the stage body, and one peripheral step raised from the base plane to contact the periphery of the base board on the stage. The base plane and the peripheral step have the surface roughness Ra below 1.5 microns, while the raised parts have the surface roughness Ry over 8 microns.

Description

technical field [0001] The present invention relates to a substrate mounting table on which a substrate such as a glass substrate for manufacturing a flat panel display (FPD) is mounted and a manufacturing method thereof, and further relates to a substrate processing apparatus for performing a process such as dry etching on a substrate using the substrate mounting table. Background technique [0002] For example, in the FPD manufacturing process, plasma processing such as dry etching, sputtering, and CVD (Chemical Vapor Deposition) is often used for a glass substrate as a substrate to be processed. [0003] In this type of plasma processing, for example, a pair of parallel plate electrodes (upper and lower electrodes) are placed in a chamber, a substrate to be processed is placed on a susceptor (mounting table) that functions as the lower electrode, and a processing gas is introduced into the chamber. In the chamber, high-frequency power is applied to at least one of the ele...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683H01L21/3065H01L21/205C23F4/00C23C16/458C23C14/50
CPCH01J37/32715H01L21/67069
Inventor 林圣里吉务
Owner TOKYO ELECTRON LTD
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