MEMS device manufacturing method
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[0023]A preferred embodiment of the MEMS device manufacturing method according to the present invention will now be described in detail with reference to the attached drawings. FIG. 1 is a perspective view of a substrate 2 in the condition where a plurality of MEMS devices have not yet been formed thereon. The substrate 2 shown in FIG. 1 is formed from a glass substrate having a thickness of 200 μm, for example. The outer circumference of the substrate 2 is formed with a notch 21 for indicating a reference position. In manufacturing a plurality of MEMS devices by using the substrate 2 formed from a glass substrate shown in FIG. 1, a break start point forming step is first performed to form a break start point in the substrate 2 along the areas corresponding to a plurality of crossing streets set on the substrate 2 before forming a plurality of MEMS devices on the substrate 2.
[0024]This break start point forming step is performed by using a laser processing apparatus 3 shown in FIG. ...
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