Electroless deposition process on a silicide contact
a technology of electronic deposition and contact, which is applied in the direction of anti-corrosion paints, resistive material coatings, chemical vapor deposition coatings, etc., can solve the problems of affecting the device yield of fabricated substrates, the deposition process of these materials, and the displacement of voids from one layer to the nex
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0031] Embodiments as described herein provide methods for depositing a material on a substrate during electroless deposition processes. In one embodiment, the substrate contains a contact aperture having an exposed silicon contact surface. In another embodiment, the substrate contains a contact aperture having an exposed silicide contact surface. The apertures are filled with a metal contact material by exposing the substrate to an electroless deposition process. The metal contact material may contain a cobalt material, a nickel material, and alloys thereof. Prior to filling the apertures, the substrate may be exposed to a variety of pretreatment processes, such as preclean processes and activations processes. A preclean process may remove organic residues, native oxides, and other contaminants during a wet clean process or a plasma etch process. Embodiments of the process also provide the deposition of additional layers, such as a capping layer.
Metal-Containing Interconnect Proc...
PUM
Property | Measurement | Unit |
---|---|---|
Molar density | aaaaa | aaaaa |
Molar density | aaaaa | aaaaa |
Molar density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com