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Substrate processing apparatus and substrate processing method

a substrate processing and substrate technology, applied in the direction of photomechanical treatment, instruments, photosensitive materials, etc., can solve the problems of abnormalities in the electric system of the substrate processing apparatus, operational troubles, and inability to make a resist pattern finer than, so as to prevent the operation of troubles caused by liquid attached to the substrate in the exposure devi

Inactive Publication Date: 2006-05-11
SOKUDO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0011] It is an object of the present invention to provide a substrate processing apparatus and a substrate processing method in which operational troubles due to a liquid attached to substrates in an exposure device are prevented.
[0012] Another object of the present invention is to provide a substrate processing apparatus in which processing defects in substrates due to the contamination after exposure processing are prevented.

Problems solved by technology

With such conventional exposure devices, however, the line width of an exposure pattern is determined by the wavelength of the light source of an exposure device, thus making it impossible to make a resist pattern finer than that.
Thus, when combining the substrate processing apparatus according to the aforementioned JP 2003-324139 A with the exposure device using the liquid immersion method as described in the aforementioned WO99 / 49504 pamphlet as an external device, the liquid adhering to the substrate that has been carried out of the exposure device may drop in the substrate processing apparatus, causing operational troubles such as abnormalities in the electric system of the substrate processing apparatus.
There is also a possibility that the substrate is contaminated by, e.g., residual droplets after the exposure processing and the eluate from an organic film on the substrate, causing processing defects in the substrate in subsequent processing steps.

Method used

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  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method

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Experimental program
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Effect test

first embodiment

(1) First Embodiment

[0119] (1-1) Configuration of Substrate Processing Apparatus

[0120]FIG. 1 is a plan view of a substrate processing apparatus according to a first embodiment of the invention.

[0121]FIG. 1 and each of the subsequent drawings is accompanied by the arrows that indicate X, Y, and Z directions perpendicular to one another, for clarification of positions. The X and Y directions are perpendicular to each other in a horizontal plane, and the Z direction corresponds to the vertical direction. In each of the directions, the direction toward an arrow is defined as +direction, and the opposite direction is defined as −direction. The rotation direction about the Z direction is defined as θ direction.

[0122] As shown in FIG. 1, the substrate processing apparatus 500 includes an indexer block 9, an anti-reflection film processing block 10, a resist film processing block 11, a development processing block 12, and an interface block 13. An exposure device 14 is arranged adjacent ...

second embodiment

(2) Second Embodiment

[0245] (2-1) Drying Processing Unit Using Two-Fluid Nozzle

[0246] A substrate processing apparatus according to a second embodiment is different from the substrate processing apparatus according to the first embodiment in using a two-fluid nozzle shown in FIG. 13 in the drying processing unit DRY, instead of the nozzle 650 for cleaning processing and the nozzle 670 for drying processing in FIG. 4. The configuration of the substrate processing apparatus according to the second embodiment is otherwise similar to that of the substrate processing apparatus according to the first embodiment.

[0247]FIG. 13 is a longitudinal cross section showing an example of the internal structure of the two-fluid nozzle 950 for use in cleaning and drying processings. The two-fluid nozzle 950 is capable of selectively discharging a gas, a liquid, and a fluid mixture of the gas and the liquid.

[0248] The two-fluid nozzle 950 in this embodiment is so-called an external-mix type. The ex...

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Abstract

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention relates to substrate processing apparatuses and substrate processing methods for applying processing to substrates. [0003] 2. Description of the Background Art [0004] A substrate processing apparatus is used to apply a variety of processings to substrates such as semiconductor substrates, substrates for use in liquid crystal displays, plasma displays, optical disks, magnetic disks, magneto-optical disks, photomasks, and other substrates. [0005] Such a substrate processing apparatus typically applies a plurality of successive processings to a single substrate. The substrate processing apparatus as described in JP 2003-324139 A comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block as an external device separate from the substrate pr...

Claims

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Application Information

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IPC IPC(8): G03D5/00
CPCG03F7/70341G03F7/70991
Inventor KANEYAMA, KOJIHISAI, AKIHIROASANO, TORUKOBAYASHI, HIROSHIOKUMURA, TSUYOSHIYASUDA, SHUICHIKANAOKA, MASASHIMIYAGI, TADASHISHIGEMORI, KAZUHITO
Owner SOKUDO CO LTD
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