Exposure pattern forming method

Abstract

A reference glass board (8B) whereupon a reference pattern (P) to be an exposure position reference is previously formed is arranged on a lower side of a glass board (8A), and is transferred in an arrow A direction by a transfer means (4). The reference pattern (P) is illuminated from the lower part of the transfer means (4) by the illuminating means (6), and an image of the reference pattern (P) is picked up by an image pickup means (5) arranged on an upper part of the transfer means (4). An optical system control means (7) detects a reference position previously set to the reference pattern (P) of which the image is picked up by the image pickup means (5), and controls irradiation start or irradiation stop of laser beams, having the reference position as a reference. Then, a pixel of a black matrix to be a reference of a functional pattern formed by being laminated on the glass board (8A) is exposed at a prescribed position on the glass board (8A). Thus, alignment accuracy of the functional pattern is improved and cost increase of an exposure apparatus is suppressed.

Description

technical field [0001] The present invention relates to an exposure pattern forming method for directly exposing and forming a functional pattern on an object to be exposed. Specifically, a reference position set by a functional pattern previously formed on the object to be exposed and used as a reference is detected by photographing with an imaging device. , using the reference position as a reference to control the start or stop of light beam irradiation to improve the overlapping accuracy of the functional patterns and at the same time try to suppress the cost increase of the exposure device. Background technique [0002] The exposure pattern forming method of the conventional exposure apparatus uses a mask in which a mask pattern equivalent to a functional pattern is formed on a glass substrate in advance, and copies and exposes the above mask pattern on an object to be exposed. (Stepper) device, micro-mirror projection (Mirror Projection) ...

AI Technical Summary

Problems solved by technology

However, in these existing exposure pattern forming methods, when multi-layer functional patterns are stacked and formed, the overlapping accuracy of functional patterns between layers becomes a problem.

In particular, in the case of large-scale masks used in the formation of TFTs and color filters for large-scale liquid crystal displays, the arrangement of the mask pattern is required to have high absolute dimensional accuracy, so the cost of the mask increases.

In addition, in order to obtain the above-mentioned registration accuracy, alignment between the underlying functional pattern and the mask pattern is required, which is difficult to achieve especially for large masks

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