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Metal cobalt electrodeposition method by ion liquid

A technology of ionic liquid and electrodeposition, which is applied in the direction of photography technology, instrument, photography auxiliary technology, etc., can solve the problem of easy formation of alloy deposition layer and so on

Inactive Publication Date: 2006-12-27
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the defect that the alloy deposition layer is easily formed on the surface of the substrate in the current method of electro-depositing cobalt with an ionic liquid containing EMIC, and provides a method for electro-depositing metal cobalt with an ionic liquid

Method used

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specific Embodiment approach 1

[0004] Specific embodiment one: the method for present embodiment ionic liquid electrodeposition metal cobalt is carried out as follows: (1) EMIC, anhydrous cobalt chloride and be liquid state at room temperature, concentration is the organic alcohol of analytical grade by 1: 0.3 ~2: 2.5~18 molar ratio is mixed, is prepared into ionic liquid electrodeposition liquid; 2 Electrodeposition in the constant current mode, the anode used in electrodeposition does not chemically react with the ionic liquid electrodeposition solution, the distance between the anode and the substrate is 1-10 cm, and the electrodeposition temperature is 60-100 ° C; The substrate with the electrodeposition layer is taken out from the ionic liquid electrodeposition solution, rinsed with ethanol and distilled water in sequence, and then dried to obtain a cobalt deposition layer on the surface of the substrate; wherein step (1) is carried out in a vacuum glove box.

[0005] In this embodiment, the thickness ...

specific Embodiment approach 2

[0006] Specific embodiment two: the difference between this embodiment and specific embodiment one is: in step (1), EMIC, anhydrous cobalt chloride and be liquid state at room temperature, concentration is the organic alcohol of analytical grade by 1: 0.5~ 1.8: 4-15 molar ratio mixing. Other steps are the same as those in Embodiment 1.

specific Embodiment approach 3

[0007] Specific embodiment three: the difference between this embodiment and specific embodiment one is: in step (1), EMIC, anhydrous cobalt chloride and be liquid state at room temperature, concentration is the organic alcohol of analytical grade by 1: 1~ 1.5: 5-14 molar ratio mixing. Other steps are the same as those in Embodiment 1.

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Abstract

This is the method of electrodeposition of metals cobalt in Ionic Liquids. It resolve the problem that electrodeposition of metals cobalt in Ionic Liquids which content EMIC can form crystalline alloy on the surface of substrate. The steps are: (1) mixed anhydrous EMIC, cobalt chloride and organic alkoxide by the molar ratio of 1:0.3 - 2:2.5 - 18 in vacuum glovebox; (2) emerge the substrate into Ionic Liquids, with the current density of 30 - 150A / m2, temperature of 60-100 DEG C electrodeposition under constant current. The anode doesn't react with Ionic liquids. The distance between anode and substrate is 1 - 10cm; (3) take the substrate with electrodepositing coatings out of the Ionic liquids, then wash with ethanol and distilled water, and dry it. This method can get even, pure depositing coating with metallic luster.

Description

technical field [0001] The invention relates to a method for electrodepositing metal with an ionic liquid. Background technique [0002] Ionic liquids refer to organic liquid substances that are completely composed of ions at room temperature and similar temperatures (less than 100°C), also known as room temperature molten salts. Metal cobalt has special magnetic properties, so the technology of using ionic liquid to electrodeposit cobalt has attracted much attention. At present, ionic liquid electrodeposited cobalt uses 1-methyl-3-ethylimidazole chloride (EMIC) and AlCl 3 or ZnCl 2 Mix to make an ionic liquid electrodeposition solution, and use the constant potential electrodeposition method to electrodeposit cobalt on the surface of the substrate, but because the ionic liquid electrodeposition solution contains Co 2+ cations other than that, so it is easy to form an alloy deposition layer instead of a pure cobalt deposition layer on the surface of the substrate. For ex...

Claims

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Application Information

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IPC IPC(8): C25C1/08
Inventor 杨培霞安茂忠
Owner HARBIN INST OF TECH
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