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Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition

A technology of photosensitive composition and light-shielding film, applied in the direction of photosensitive materials used in opto-mechanical equipment, etc., can solve the problems of poor sensitivity and decreased permeability, and achieve the improvement of transmittance, sensitivity, and sensitivity. degree of effect

Active Publication Date: 2006-06-07
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When such a method is used, since the transmittance of light in the ultraviolet region that contributes to the improvement of the photosensitivity (sensitivity) of the photosensitive composition for light-shielding film formation decreases, there is a problem that the sensitivity deteriorates significantly.

Method used

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  • Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition
  • Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition
  • Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition

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Embodiment

[0090] Examples of the present invention are described below, but the present invention is by no means limited thereto.

[0091] (Synthesis example of resin)

[0092] According to the record of JP-A-2001-354735, 235 g of bisphenol fluorene type epoxy resin (235 epoxy equivalents) and 110 mg of tetramethylammonium chloride, 2,6-di-tert-butyl-4- 100 mg of methylphenol and 72.0 g of acrylic acid were heated and dissolved at 90-100°C while blowing air thereinto at a rate of 25 mL / min. Next, while the solution was kept cloudy, the temperature was gradually raised, and it was heated to 120° C. to completely dissolve it. Wherein the solution gradually turns into a transparent viscous state, and the stirring is continued in this state.

[0093] Meanwhile, the acid value was measured, and heating and stirring were continued until it became 1.0 mgKOH / g or less. It takes 12 hours for the acid value to reach the target value. Then, it cooled to room temperature, and the bisphenol fluo...

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Abstract

A photosensitive composition for forming a light-shielding film, which contains (a) carbon black as a light-shielding pigment, (b) a photopolymerizable compound, and (c) a photopolymerization initiator, and the dispersed particle diameter of the carbon black is 100- 250nm, preferably 150-200nm.

Description

technical field [0001] The present invention relates to a photosensitive composition for forming a light-shielding film, a black matrix formed from the photosensitive composition for forming a light-shielding film, and more specifically, to a light-shielding film suitable for forming a black matrix of a liquid crystal panel, a plasma display panel, etc. A photosensitive composition for formation, and a black matrix formed from the photosensitive composition for light-shielding film formation. [0002] This application claims the priority of Japanese Invention Patent Application No. 2004-350590 filed on December 3, 2004, and uses the content thereof here. Background technique [0003] Liquid crystal panels, especially TN and STN liquid crystal panels, have the following structure: a black matrix for emphasizing image contrast is provided on a glass substrate, and a transparent protective film, transparent electrodes, alignment films, liquid crystals, transparent electrodes, ...

Claims

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Application Information

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IPC IPC(8): G03F7/004
Inventor 丸山健治信太胜内河喜代司
Owner TOKYO OHKA KOGYO CO LTD
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