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Master disk exposure apparatus and master disk exposure method

A technology of exposure device and exposure method, applied in the direction of recording/reproducing by optical method, optical recording/reproducing/erasing method, optical record carrier, etc. Problems such as signal intermodulation distortion

Inactive Publication Date: 2005-05-04
HITACHT MAXELL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, it is difficult to strictly control the exposure intensity of the photoresist layer of the groove (pit) formation part and the exposure intensity of the photoresist layer of the back (land) formation part, resulting in groove (pit) width increase and back (land) formation. width narrowing, signal intermodulation distortion tends to occur between adjacent tracks

Method used

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  • Master disk exposure apparatus and master disk exposure method
  • Master disk exposure apparatus and master disk exposure method
  • Master disk exposure apparatus and master disk exposure method

Examples

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Effect test

specific example 1-1

[0086] In the following, take an optical disc (disk) original disc exposure device, an optical disc (disk) original disc exposure method, and an optical disc (disk) substrate as examples, refer to Figure 1 ~ Figure 5 The master exposure device, master exposure method, and information recording substrate of the present invention will be described.

[0087] Such as figure 1 As shown, the optical disc (disk) original disc exposure device of this example is mainly composed of an optical disc (disk) original disc 1, a rotating table that drives the optical disc (disk) original disc 1 to rotate, a fixed table 3, and a fixed table fixed at a determined position. The moving table 4 arranged between the rotating table 2 and the fixed table 3 is configured.

[0088] The disk master 1 is formed by forming a photoresist layer of uniform thickness on the surface of a smooth disk-shaped substrate made of glass, for example.

[0089] Rotating table 2, such as figure 2 As shown, the above-menti...

specific example 1-2

[0103] Figure 6 In [Specific Example 1-1], other specific examples of the master exposure method using the master exposure device are shown. In this example, except that the control device (CONT) of the master exposure apparatus changes the drive signal supplied to the second optical modulator, the exposure pattern diagram of the pit is formed in the same manner as in the specific example 1-1. Such as Figure 6 As shown in (a), in tracks t1 to t3, the same pit pattern diagrams as in [Specific Example 1-1] are formed respectively, and the bit data of track t2 is exposed ( Figure 6 (b)) and its beam waveform ( Figure 6 (c)) Same as [Specific Example 1-1]. However, regarding the beam (beam) 2, in [Specific Example 1-1], the pattern diagram opposite to the beam (beam) 1 is made, but in this example, as Figure 6 As shown in track t2 of (a), it is made: when the shortest groove (pit) P22 (length 2T) is irradiated with a beam (beam) 1, the area P / P (2T) on both sides of it is also i...

specific example 1-3

[0108] Figure 8 Shows another specific example of the master exposure method of the master exposure apparatus described in [Specific Example 1-1]. In this example, by switching the power of the laser beam (beam) to high intensity and low intensity, only a single laser beam (beam) is used based on [Specific Example 1-1] and [Specific Example] Irradiation of beam 1 and beam 2 in 1-2]. Specifically, in figure 1 In the master exposure apparatus shown, the driving of the second light modulator 21 is stopped, and the waveform in the first light modulator 17 is controlled by the controller (CONT), thereby irradiating Figure 8 The shown beam 2 has two types of power waveforms, high intensity and low intensity. Therefore, the trajectory of the beam, the high-intensity beam and the low-intensity beam are all in the center of the track (see track t2). In addition, in this example, the intensity P3 at the time of exposure of the shortest pit is set to be about 5% stronger than the intensi...

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Abstract

The invention provides original disk exposure apparatus and original disk exposure method, the object is to prevent unevenness of lengths and sizes of pits developed after an original disk is exposed and to make pit width of the shortest pit and other pits uniform. In a disk exposure method, a predetermined area of a photoresist is radiated with a beam 1 which has the intensity not less than the sensitivity of a photoresist layer and has a predetermined phase, and an area different from the predetermined area is radiated with a beam 2 which has the intensity less than the sensitivity of the photoresist layer and has a phase opposite to the predetermined phase. Both sides P / P (2T) in a disk radial direction of an area in which the shortest mark P22 is formed is radiated with the beam 2 which has the intensity less than the sensitivity of the photoresist layer. The pit width is made uniform irrespective of the pit length. Further, it is possible to form the pit having a width shorter than a pit length. Thereby, it is possible to realize a high density.

Description

Technical field [0001] The present invention relates to a master disc exposure device and a master disc exposure method, in particular to a master disc exposure device and a master disc exposure method suitable for manufacturing a high recording density information recording medium, and an information recording manufactured using the master disc exposure device and the master disc exposure method Stamper for media replication and substrate for information recording media. Background technique [0002] In the technical field of information recording media, the improvement of recording density has become an increasingly important technical issue. In the past, improvements in the linear recording density along the track and the narrowing of the track pitch (track pitch) have been used. The improvement of recording density seeks to solve such technical problems in two aspects. [0003] However, substrates for information recording media used in information recording media such as dis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B7/004G11B7/007G11B7/24G11B7/26
CPCG11B7/261
Inventor 杉山寿纪吉冈照文近禅宫田胜则
Owner HITACHT MAXELL LTD
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