Plasma processing system and method therefor
A technology of plasma and processing systems, applied in the fields of plasma, metal material coating process, semiconductor/solid state device manufacturing, etc.
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[0037] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
[0038]The invention will now be described in detail with reference to some preferred embodiments of the invention shown in the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some or all of these specific details. In other instances, well known process steps and / or structures have not been described in detail in order not to unnecessarily obscure the present invention.
[0039] In one embodiment, the present invention relates to an improved plasma processing system capable of a high degree of process uniformity control. The exemplary improved plasma processing system includes a single-chamber, substantially azimuthally symmetric (i.e., each section parallel to the plane of the wafer has a nearly ci...
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