Preparation method of mesonic pore molecular sieve carrier material
A mesoporous molecular sieve and carrier material technology, which is applied in the field of preparation of mesoporous molecular sieve carrier materials, can solve the problem of high acidity of the synthesis medium
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Embodiment 1
[0015] Example 1, the preparation of a hexagonal silica mesoporous material, the specific steps are as follows: 0.4 grams of EO 16 BO 10 (BL50-1500) was dissolved in 30 grams of 2M hydrochloric acid, stirred at room temperature, and after it was dissolved, 3 grams of ethyl orthosilicate was added. After stirring at room temperature for 24 hours, it was placed in an oven at 100° C. and aged for 24 hours. After taking it out, it was cooled, filtered, and washed to obtain a white solid, which was dried at room temperature; finally, it was burned in a muffle furnace at 550°C for 6 hours to obtain the final product. After characterization, it is known that the material is a mesoporous silica material with channels arranged in a two-dimensional hexagonal structure, and the unit cell parameter is 9.26 nanometers (d 100 The value is 8.02 nanometers), with a pore size of 6.0nm single distribution, 902m 2 / g high specific surface area and 1.03cm 3 / g of pore volume. The calcined pr...
Embodiment 2
[0016] Embodiment 2, the preparation of a kind of layered silica material: 7 grams of EO 16 BO 10 (BL50-1500) was added to 30 grams of 2M sulfuric acid, stirred at room temperature, and after it was dissolved, 3 grams of ethyl orthosilicate was added. After stirring at room temperature for 24 hours, a homogeneous solution formed. Transfer the solution to a watch glass and air dry for several days. The X-ray diffraction (XRD) pattern of the product at this time shows three sharp diffraction peaks, the corresponding d values are 8.82, 4.41 and 3.01 nm, which is a typical layered structure. After the collected solid was burned in a muffle furnace at 600°C for 5 hours, the layered structure collapsed due to the removal of polymers, which in turn led to the disappearance of all diffraction peaks.
Embodiment 3
[0017] Example 3, the preparation of a hexagonal silica mesoporous material, the specific steps are as follows: 0.4 grams of EO 16 BO 10 (BL50-1500) was dissolved in 30 grams of 2M hydrochloric acid, stirred at room temperature, and 2.5 grams of methyl orthosilicate was added after it was dissolved. After stirring at room temperature for 15 hours, it was placed in an oven at 100° C. and aged for 24 hours. After taking it out, it was cooled, filtered, and washed to obtain a white solid, which was dried at room temperature; finally, it was burned in a muffle furnace at 450° C. for 6 hours to obtain the final product. After characterization, it is known that the material is a mesoporous silica material with channels arranged in a two-dimensional hexagonal structure, and the unit cell parameter is 9.32 nanometers (d 100 The value is 8.07 nanometers), with a pore size of 6.0nm single distribution, 884m 2 / g high specific surface area and 1.01cm 3 / g of pore volume. The calcine...
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