Nano self cleaning silk broadcloth and products
A nano self-cleaning, real silk technology, applied in the field of textiles, can solve problems such as affecting performance, poor dyeing fastness of real silk, easy wrinkling and shrinkage during wearing and cleaning
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Embodiment 1
[0025] Take 2g of silk yarn and put it into 5g / L of silicon oxide containing 24g / L of AG-710 organic fluororesin from Japan Asahi Glass Co., Ltd., 5g / L of average particle size of 30nm, 10g / L of γ-aminopropyltriethoxysilane, and 6g of 2D resin / L, magnesium chloride 0.1g / L and the water system of isopropanol 20g / L, bath ratio is 1: 20, soaks 30min at 40 ℃, squeezes liquid then, makes liquid squeezed rate 70%, puts into baking oven, in Pre-bake at 90°C for 5 minutes, and continue to bake at 110°C for 1.5 minutes to obtain nanometer self-cleaning silk yarn.
Embodiment 2
[0027]Cut the real silk knitwear into 5cm square samples. The 20g / L water system was used to spray the above-mentioned low-temperature air plasma-treated fabric, then put it into an oven, pre-baked at 70°C for 30min, and continued to bake at 100°C for 4min to obtain nanometer self-cleaning silk knitwear.
Embodiment 3
[0029] Cut the worsted silk fabric into 5cm square samples, put in 30g / L of AG-7000 organic fluorine resin from Japan Asahi Glass Co., Ltd., 30g / L of titanium oxide with an average particle size of 30nm, and 50g / L of vinyl triethoxysilane , in the water system of melamine resin 3g / L, magnesium chloride 0.1g / L and isopropanol 30g / L, bath ratio is 1: 60, soaks 30min at 40 ℃, squeezes liquid then, makes liquid squeeze rate 80%, puts Enter the oven, pre-bake at 90°C for 10 minutes, and continue to bake at 120°C for 2 minutes to obtain nanometer self-cleaning real silk worsted fabric.
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