Method for representing real space characteristics of two-dimensional polariton
A polariton, real-space technology, applied in the direction of testing semiconductor impurities, instruments, measuring devices, etc., can solve difficult to explain, complex relationship between optical density of states and polariton eigenmodes, and increase the complexity of equipment. and the difficulty of the experiment to overcome the complexity of the measurement
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0024] Objects and functions of the present invention and methods for achieving them are elucidated by referring to the exemplary embodiments.
[0025] The present invention will be further described below with reference to the accompanying drawings and embodiments.
[0026] Taking the heterojunction composed of van der Waals semiconductor layered material WS2 thin film and single crystal silver disk as an example, the method of the present invention is used to characterize its spatial characteristics. The heterojunction has a lateral dimension of 70 microns and a longitudinal thickness of 2 microns.
[0027] refer to Figure 1-Figure 4 , the present invention provides a method for characterizing the real space characteristics of two-dimensional polaritons, the steps are as follows:
[0028] figure 1 It is a schematic structural diagram of the experimental measurement in the present invention. like figure 1 , the cantilever of a scattering-type scanning near-field optical...
PUM
Property | Measurement | Unit |
---|---|---|
size | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com