Exposure dose control method based on exposure dose control system

Abstract

The invention provides an exposure dose control method based on an exposure dose control system. The method comprises the following steps: controlling a shutter to open; receiving an energy value collected by an energy sensor, and determining an accumulated exposure dose value based on the energy value; determining whether the accumulated exposure dose value is not less than a target dose value; if the accumulated exposure dose value is not less than the target dose value, controlling the shutter to start to close; taking the accumulated exposure dose value corresponding to the jitter delay ending moment after the shutter is completely closed as an actual accumulated exposure dose value; determining an exposure dose error value based on the actual accumulated exposure dose value; determining whether the exposure dose error value meets requirements or not; if the exposure dose error value does not meet the requirement, updating the equivalent dose value, and returning to execute the first step; and if the exposure dose error value meets the requirement, applying the equivalent dose value to the exposure system. Through the exposure dose control method based on the exposure dose control system, the problem of low exposure dose control precision is solved.

Description

technical field [0001] The present application relates to the technical field of lithography, and in particular, to an exposure dose control method based on an exposure dose control system. Background technique [0002] The lithography process technology is a key process link in the semiconductor production process. The process flow of lithography technology is generally divided into silicon wafer pretreatment, gluing, pre-baking, exposure, development, post-baking, etching, degumming and overetching. It is a relatively complex process, and each process link affects and restricts each other. Among them, exposure is a key link that affects whether the product is qualified or not. It refers to the use of a specific wavelength and intensity of broadcasting to irradiate the photoresist through the mask, so that the photoresist in the irradiated part undergoes a photochemical reaction. corresponding graphics on the membrane. [0003] The exposure dose is the product of the ligh...

AI Technical Summary

Problems solved by technology

[0005] In view of this, the purpose of this application is to provide an exposure dose control method, device, electronic equipment and storage medium based on an exposure dose control system to solve the problem of low exposure dose control accuracy

Images