Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Atomic release source

An atom and release hole technology, applied in radiation/particle processing, nuclear engineering, etc., can solve the problems of damage to the internal devices of the device, unfavorable for the integrated design of the cold atom device, etc., and achieves a small release magnetic field, which is conducive to integrated design and simple production process. Effect

Pending Publication Date: 2022-03-15
HUAZHONG PHOTOELECTRIC TECH INST (CHINA SHIPBUILDING IND CORP THE NO 717 INST)
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method requires external pipelines for the release of atoms, which is not conducive to the integrated design of cold atom devices, and the internal glass debris may damage the internal components of the device.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Atomic release source
  • Atomic release source
  • Atomic release source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Embodiments of the application are given in the drawings. However, the present application can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of this application more thorough and comprehensive.

[0031] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terms used herein in the specification of the application are only for the purpose of describing specific embodiments, and are not intended to limit the application.

[0032] It will be appreciated that spatially relative terms such as "below", "beneath", "underneath", "un...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an atom release source which comprises a shell, an atom pool, a heater and an atom block. The shell is provided with a near end and a far end which are opposite, and the far end of the shell is provided with an atom release hole; the atomic pool comprises a pool shell and a pool cover, the pool shell is installed in the shell, the pool shell is provided with an opening, the pool cover detachably covers the opening in a sealing mode and is tightly pressed through external air pressure, and when the external air pressure of the pool shell is reduced to a certain level, the pool cover falls off; the atomic block is arranged in the cell shell; the heater is arranged in the shell, is positioned on the outer side of the cell shell, and is used for heating the atom block in the cell shell; according to the invention, the technical problem that a miniaturized atom release source continuously and controllably releases elementary atoms in an ultrahigh vacuum environment is solved, the use safety and convenience of the atom release source are improved, and the potential risk of damaging internal devices is solved.

Description

technical field [0001] The invention relates to the technical field of cold atoms, in particular to an atom release source. Background technique [0002] Cold atom technology is a technology that realizes the research and precise measurement of atomic physical properties by manipulating the change of atomic quantum state. It is applied in many fields such as quantum communication, atomic clock, atomic gravimeter, and quantum simulation. The atomic release source provides the high-purity elemental atoms needed for the cold atom device to work. Usually cold atom devices need to be better than 10 -7 In the ultra-high vacuum environment of Pa, the atomic gas dispersed in space is captured from the background gas in the environment. This requires the atom release source to have an ultra-low impurity gas release rate and a high atom release capability. [0003] There are two common implementations of atomic release sources. One is the electrochemical reduction of atomic compou...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/00
CPCG21K1/00
Inventor 周超郭劼张柯王斌马思迁
Owner HUAZHONG PHOTOELECTRIC TECH INST (CHINA SHIPBUILDING IND CORP THE NO 717 INST)
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com