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Novel electrochemical polishing device and method

A polishing device and electrochemical technology, applied in the field of metal surface treatment, can solve problems such as affecting polishing quality and uneven polishing of workpieces, and achieve the effects of ensuring polishing effect, uniform roughness and brightness, and promoting ion diffusion.

Pending Publication Date: 2021-12-10
安徽亚兰密封件股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in common electrochemical polishing devices, the thickness of the mucous film and the strength of the electric field are different in different areas on the surface of the anode workpiece, which will lead to uneven polishing of the workpiece, thereby affecting the polishing quality

Method used

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  • Novel electrochemical polishing device and method
  • Novel electrochemical polishing device and method

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Experimental program
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Effect test

Embodiment 1

[0044] Preparation of electrolyte solution 3: The formula composition of electrolyte solution 3 in the present invention includes the following components, wherein the content of each component and the preferred content of this embodiment are shown in Table 1: Table 1.

[0045] component name Content range This embodiment is preferred sodium hydroxide 10-30g / L 10g / L Sodium citrate 0.1-0.2mol / L 0.1mol / L Glycerol 10-20ml / L 10ml / L water Appropriate amount Appropriate amount

[0046] Pre-treatment before polishing: First, sand the tungsten workpiece to be polished to remove the surface oxide layer, then simply clean it with deionized water to remove the surface dust, and then use anhydrous ethanol in an ultrasonic cleaner to remove surface oil and attached particles, and then The surface is rinsed with deionized water to remove all impurities that can be rinsed away, and finally dried in a hot air stream. figure 2 The AFM imag...

Embodiment 2

[0051] Preparation of electrolyte solution 3: The formula composition of electrolyte solution 3 in the present invention includes the following components, wherein the content of each component and the preferred content of this embodiment are shown in Table 2: Table 2.

[0052] component name Content range This embodiment is preferred sodium hydroxide 10-30g / L 20g / L Sodium citrate 0.1-0.2mol / L 0.15mol / L Glycerol 10-20ml / L 20ml / L water Appropriate amount Appropriate amount

[0053] Processing method is as shown in embodiment 1;

[0054] Using the above electrochemical polishing parameters and the electrochemical polishing device, the tungsten workpiece obtained in this embodiment has uniform and low surface roughness. Measured by AFM, the roughness of both ends of the tungsten workpiece surface is 0.991nm and 0.943nm respectively, as shown in reference Figure 5 with Image 6 shown.

Embodiment 3

[0056] Preparation of electrolyte solution 3: The formula composition of electrolyte solution 3 in the present invention includes the following components, wherein the content of each component and the preferred content of this embodiment are shown in Table 3: Table 3.

[0057] component name Content range This embodiment is preferred sodium hydroxide 10-30g / L 30g / L Sodium citrate 0.1-0.2mol / L 0.2mol / L Glycerol 10-20ml / L 15ml / L water Appropriate amount Appropriate amount

[0058] Processing method is as shown in embodiment 1;

[0059] Using the above electrochemical polishing parameters and the electrochemical polishing device, the tungsten workpiece obtained in this embodiment has uniform and low surface roughness. Measured by AFM, the roughness of both ends of the tungsten workpiece surface is 0.757nm and 0.748nm respectively, as shown in reference Figure 7 with Figure 8 shown.

[0060] Working principle of the prese...

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Abstract

The invention discloses a novel electrochemical polishing device and method. The novel electrochemical polishing device comprises an electrolytic bath, an electrolyte graphite electrode, a platinum electrode, a fixed movable seat and a heating magnetic stirrer, wherein a magnetic rotor is arranged at the top of the heating magnetic stirrer; the graphite electrode and the platinum electrode are both located in the electrolytic bath; the negative electrode of a power supply is electrically connected with the graphite electrode; the positive electrode of the power supply is electrically connected with the platinum electrode; the fixed movable seat is used for fixing the graphite electrode and the platinum electrode and adjusting the distance between the graphite electrode and the platinum electrode; and the heating magnetic stirrer, a temperature sensor and the magnetic rotor are used in cooperation to control the temperature of the electrolyte and stir the electrolyte contained in the electrolytic bath. After the device and the method are adopted, the surface polishing uniformity of a workpiece is further improved, a tungsten workpiece with uniform roughness and brightness is obtained, the surface quality of the workpiece is improved, and the tungsten workpieces of different sizes can be machined.

Description

technical field [0001] The invention relates to the technical field of metal surface treatment, in particular to a novel electrochemical polishing device and method. Background technique [0002] Electrochemical polishing is a surface treatment technology developed in recent decades, also known as electrolytic polishing. The workpiece to be thrown is used as the anode, and the insoluble metal or graphite is used as the cathode. The two poles are immersed in the electrolytic cell at the same time, and the direct current is used to generate selective anode dissolution, so as to achieve the effect of removing fine burrs on the surface of the workpiece and increasing the brightness. Due to the high efficiency and good quality of electrochemical polishing, the roughness of the metal surface can be reduced within a few minutes. [0003] Tungsten (W) has been widely used in mechanical seals, aerospace, electronics and nuclear fusion, etc. field. Especially in the field of cement...

Claims

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Application Information

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IPC IPC(8): C25F7/00C25F3/26
CPCC25F7/00C25F3/26
Inventor 刘东光黄炳喜杨浩黄亚男
Owner 安徽亚兰密封件股份有限公司
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