Multi-channel capacitively coupled plasma jet device and working method

A plasma and capacitive coupling technology, applied in the direction of plasma, electrical components, etc., can solve the mutual interference of multiple groups of anodes and cathodes, can not solve the problem of multi-channel jet, can not achieve stable and effective plasma jet, etc. Reasonable and efficient shaping effect

Active Publication Date: 2022-06-28
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But the weak point of this patent document is: the device can only regulate the area of ​​the jet, so there is no technical problem that can solve the multi-channel jet
However, the disadvantage of this patent document is that this patent focuses on adjusting the array, and there is a problem that multiple sets of anodes and cathodes interfere with each other, and it cannot realize the combination of plasma jets into jet arrays stably and effectively.

Method used

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  • Multi-channel capacitively coupled plasma jet device and working method
  • Multi-channel capacitively coupled plasma jet device and working method
  • Multi-channel capacitively coupled plasma jet device and working method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] like figure 1 and image 3 As shown, a multi-channel capacitively coupled plasma jet device includes: a gas guiding and mixing structure 1, a plasma generator 2, a radio frequency circuit 3 and an air inlet pipe 4; the gas guiding and mixing structure 1 passes through the air inlet The pipeline 4 is connected to the plasma generator 2, the radio frequency circuit 3 is electrically connected to the plasma generator 2, the anode plate 22, the cathode plate 23 and the insulating medium plate 26 are installed in the plasma generator 2, and the anode plate 22 and the cathode plate 23 are installed between The insulating medium plate 26 is provided with a plurality of reaction channels 27 . The gas guiding and mixing structure 1 includes: a gas source 11 and a gas mixing and rectifying device 12 , there are multiple gas sources 11 , one end of the multiple gas sources 11 is connected to one end of the gas mixing and rectifying device 12 and passes through the gas mixing and ...

Embodiment 2

[0060] Example 2 is a preferred example of Example 1.

[0061] like figure 1 As shown, the present invention provides a multi-channel capacitively coupled plasma jet device, including functional components such as a gas guiding and mixing structure 1 , a gas flow control valve 21 , a plasma generator 2 and a radio frequency power line interface 33 . Among them, the gas guiding and mixing structure 1 is used for the introduction, uniform mixing and gas flow rectification of fluorine-containing reactive gas and inert gas; the gas flow control valve 21 is used for real-time control of the gas flowing into the plasma generator 2 and each of the generators. The flow rate of the reaction channel 27; the plasma generator 2 uses a high-frequency electromagnetic field to excite the inert gas to a plasma state under atmospheric pressure, so that the reactive gas is excited in the plasma active atmosphere to generate active particles; the radio frequency power line interface 33 is used f...

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PUM

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Abstract

The invention provides a multi-channel capacitively coupled plasma jet device and a working method, comprising: a gas diversion and mixing structure, a plasma generator, a radio frequency circuit, and an intake pipe; the gas diversion and mixing structure passes through the The air inlet pipe is connected to the plasma generator; the radio frequency circuit is electrically connected to the plasma generator; an anode plate, a cathode plate and an insulating medium plate are installed in the plasma generator; the anode plate and the The insulating medium plate is installed between the cathode plates, and the insulating medium plate is provided with a plurality of reaction channels. The flow rate of each jet unit of the device can be independently controlled, so that the removal function of the linear jet can be accurately calculated and adjusted, so that the complex surface can be finely and efficiently modified.

Description

technical field [0001] The invention relates to the design and working method of an atmospheric plasma generating device, in particular to a multi-channel capacitively coupled plasma jet device and a working method. Background technique [0002] Atmospheric plasma processing technology is a new type of processing method proposed and gradually developed in the 1990s. It is a chemical etching material removal method. During processing, in the atmospheric environment, some inert gases are ionized to form a plasma state, so that the fluorine-containing reactive gas is excited under this condition to form active reactive atoms, and chemically react with the material to be processed to generate gas products to achieve material removal. Atmospheric plasma processing has advantages that other processing methods cannot have at the same time, such as high material removal rate, non-contact processing does not produce subsurface damage, and the removal amount can be calculated and anal...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/26
CPCH05H1/26
Inventor 李洲龙梁锐彬朱利民
Owner SHANGHAI JIAO TONG UNIV
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