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Defect type UiO-66 photocatalytic material, and preparation method and application thereof

A photocatalytic material, uio-66 technology, applied in chemical instruments and methods, physical/chemical process catalysts, organic compound/hydride/coordination complex catalysts, etc., can solve the lack of catalytic active sites and catalytic performance of MOFs Few reports, high recombination rate and other issues, to achieve high-efficiency photocatalytic activity, increase specific surface area and pore size, and improve photocatalytic performance

Pending Publication Date: 2021-10-29
SHAANXI UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as far as photocatalysis is concerned, most of the reported MOFs materials are usually used as support materials in the catalytic process, while studies on their own catalytic performance are rarely reported.
The main reason is that most stable MOFs materials used for photocatalytic reduction are composed of metal clusters such as zirconium-containing oxygen clusters and aluminum-oxygen clusters coordinated with carboxylic acid ligands, resulting in the lack of catalytic active sites in highly crystalline MOFs, and photogenerated electrons ( e - )-hole (h + ) pair has a high recombination rate, which greatly limits its further application

Method used

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  • Defect type UiO-66 photocatalytic material, and preparation method and application thereof
  • Defect type UiO-66 photocatalytic material, and preparation method and application thereof
  • Defect type UiO-66 photocatalytic material, and preparation method and application thereof

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preparation example Construction

[0030] The invention discloses a method for preparing a defect-type UiO-66 photocatalytic material. When preparing a zirconium-based metal framed material UiO-66, adding a monocarboxylic acid crystal regulator to regulate the structure of UiO-66, a Defect-type UiO-66 photocatalytic material. The above method specifically includes the following steps:

[0031] The precursor solution is mixed with the monocarboxylic acid crystal modifier, stirred, subjected to solvothermal reaction, purified and then dried to obtain the defective UiO-66 photocatalytic material.

[0032] The precursor solution is a mixed solution of a metal zirconium salt and an organic ligand; specifically, the solvent used for the precursor solution is N,N-dimethylformamide, N,N-dimethylpropionamide, N,N - one or more of diethylpropionamide; specifically, the metal zirconium salt is one or more of zirconium tetrachloride, zirconium nitrate, zirconium oxychloride; specifically, the organic ligand is amino One ...

Embodiment 1

[0040] A preparation method of defect-type UiO-66 photocatalytic material, comprising the following steps:

[0041] Weigh 247.5mg (1.0mmol) of zirconium tetrachloride, ultrasonically dissolve it in 25mL N,N-dimethylformamide solution, record it as solution 1, and set aside; weigh 9.6mg (0.5mmol) of aminoterephthalic acid, ultrasonically Dissolve in 25mL N,N-dimethylformamide solution, record it as solution 2, and set aside; pour solution 2 into solution 1, keep stirring for 15 minutes, add 0.5mL trifluoroacetic acid to it, continue stirring to mix evenly , transfer the mixed solution to a 100mL autoclave at 120°C for 24 hours, turn off the oven after the reaction, cool to room temperature, centrifuge the mixed product to obtain a precipitate, and use N,N-dimethylformamide for the obtained precipitate Washing and washing with methanol three times respectively, centrifuging after washing to obtain a solid product; soaking the obtained solid product in methanol at room temperatur...

Embodiment 2

[0043] A preparation method of defect-type UiO-66 photocatalytic material, comprising the following steps:

[0044] Weigh 247.5mg (1.0mmol) of zirconium tetrachloride, ultrasonically dissolve it in 25mL N,N-dimethylformamide solution, record it as solution 1, and set aside; weigh 192.4mg (1.0mmol) of aminoterephthalic acid, Ultrasonic dissolved in 25mL N,N-dimethylformamide solution, recorded as solution 2, and set aside; Pour solution 2 into solution 1, after stirring continuously for 15min, add 1.0mL trifluoroacetic acid to it, continue stirring to mix Evenly, transfer the mixed solution to a 100mL autoclave at 180°C for 12 hours, turn off the oven after the reaction, cool to room temperature, centrifuge the mixed product to obtain a precipitate, and use N,N-dimethyl formaldehyde Amide washing and methanol washing 3 times respectively, after the washing, centrifuge to obtain a solid product; soak the obtained solid product in methanol at room temperature for 12 hours, centri...

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Abstract

The invention discloses a defect type UiO-66 photocatalytic material, and a preparation method and application thereof, and belongs to the field of preparation of photocatalytic materials. According to the preparation method, when a zirconium-based metal framed material is prepared, a monocarboxylic acid crystal regulator is added for structural regulation and control, so that the defect type UiO-66 photocatalytic material is obtained. The preparation method comprises the following steps: uniformly mixing a precursor solution for preparing the zirconium-based metal framed material with a monocarboxylic acid crystal regulating agent, carrying out solvothermal reaction, and purifying and drying after the solvothermal reaction is finished, so as to obtain the defect type UiO-66 photocatalytic material. According to the preparation method disclosed by the invention, the photocatalytic performance of the traditional UiO-66 photocatalyst is effectively improved through a preparation process with a simple process. According to the prepared defect type UiO-66 photocatalytic material, the specific surface area and the pore diameter of the material are effectively increased, the migration efficiency of photo-induced electrons is effectively improved, and the photocatalytic performance is obviously improved compared with that of a single-crystal UiO-66 photocatalyst.

Description

technical field [0001] The invention belongs to the field of photocatalytic material preparation, and relates to a defect-type UiO-66 photocatalytic material and a preparation method and application thereof. Background technique [0002] The rapid development of industry has led to increasingly serious heavy metal pollution, especially the pollution of hexavalent chromium Cr(VI), which widely exists in the wastewater of industrial production processes such as electroplating, printing and dyeing, and tanning. Cr(VI) is carcinogenic and mutagenic, and its discharge into the environment will cause great damage to the human body and the environment. Therefore, how to remove or reduce hexavalent chromium from wastewater efficiently and at low cost is one of the research topics. [0003] The current treatment technologies for Cr(VI) include ion exchange method, membrane separation technology, chemical precipitation method, etc., but there are defects such as high energy consumpti...

Claims

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Application Information

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IPC IPC(8): B01J31/22B01J35/10C02F1/30C02F101/22
CPCB01J31/1691B01J31/223C02F1/30B01J2531/48C02F2305/10C02F2101/22B01J35/39B01J35/61
Inventor 强涛涛尉梦笛
Owner SHAANXI UNIV OF SCI & TECH
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