Semiconductor process equipment and gas supply assembly thereof

Abstract

The invention provides semiconductor process equipment and a gas supply assembly thereof. The gas supply assembly is used for providing process gas for a plurality of gas cabinets of the semiconductor process equipment, each gas cabinet comprises a cabinet body and a gas distribution disc arranged in the cabinet body, the gas supply assembly comprises a gas inlet pipeline, the gas inlet pipeline is provided with a gas inlet end and a plurality of gas outlet ends, the plurality of gas outlet ends are used to penetrate through gas inlets of the plurality of cabinet bodies in a one-to-one correspondence mode to be connected with the corresponding gas distribution discs, the gas supply assembly further comprises a sealing pipeline, the gas inlet pipeline is located in the sealing pipeline, the sealing pipeline is provided with a plurality of gas outlet sealing ends, the plurality of gas outlet sealing ends are used for being in sealing connection with the gas inlets of the plurality of cabinet bodies in a one-to-one correspondence mode, and the gas outlet sealing ends are used for being in sealing connection with the gas inlets of the plurality of the cabinet bodies in a one-to-one correspondence mode, and therefore, the sealing pipeline communicates with the interiors of the plurality of cabinet bodies. According to the semiconductor process equipment and the gas supply assembly thereof, the dangerous gas leaked from the gas inlet pipeline is limited by the sealing pipeline and does not leak into the environment, and the dangerous gas in the sealing pipeline can be sucked into a gas holder and then detected, so that the leakage detection of the gas inlet pipeline is realized, and the safety of the semiconductor process equipment is improved.

Description

technical field [0001] The invention relates to the field of semiconductor process equipment, in particular to a semiconductor process equipment and a gas supply assembly thereof. Background technique [0002] In the semiconductor process, the composition of the process gas is often used such as hydrogen (H2), diborane (B 2 h 6 ) and other flammable and explosive gases (the explosive volume fraction of H2 in air is 4%~ [0003] 75%, diborane (B 2 h 6 ) in the air with an explosion volume fraction of 0.8% to 88%, which are extremely flammable and explosive gases), the safety design and leak detection of process gas pipelines are extremely important. [0004] Such as figure 1 Shown is a common semiconductor process equipment structure, including 1 equipment front end module (EquipmentFront End Module, EFEM, usually including manipulator, pre-alignment mechanism, loading port assembly, fan / filter unit and other devices), 1 A transfer mechanism (Transfer Mechanism, TM), 4 ...

AI Technical Summary

Problems solved by technology

[0005]However, the existing semiconductor process equipment can only detect the leakage of flammable and explosive gas inside the gas cabinet, and cannot detect the leakage of the intake pipeline. The safety risk of flammable and explosive gas leaking into the environment from the air intake pipeline exposed outside the gas cabinet

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