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a co 2 Method for Directly Fabricating Sinusoidal Phase Grating on Fused Silica Surface by Laser

A phase grating and fused silica technology, which is applied in laser welding equipment, welding equipment, diffraction gratings, etc., can solve the problem that the laser cannot directly prepare fused silica sinusoidal phase grating, etc., and achieves convenient and flexible preparation, easy implementation, and high laser damage threshold. Effect

Active Publication Date: 2022-07-19
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to solve the technical problem that the laser cannot directly prepare the fused silica sinusoidal phase grating, the invention provides a CO 2 Method of Directly Fabricating Sinusoidal Phase Grating on the Surface of Fused Silica by Laser

Method used

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  • a co <sub>2</sub> Method for Directly Fabricating Sinusoidal Phase Grating on Fused Silica Surface by Laser
  • a co <sub>2</sub> Method for Directly Fabricating Sinusoidal Phase Grating on Fused Silica Surface by Laser
  • a co <sub>2</sub> Method for Directly Fabricating Sinusoidal Phase Grating on Fused Silica Surface by Laser

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Embodiment 1

[0038] like Figure 1-Figure 5 shown, a CO 2 The method of directly preparing sinusoidal phase grating on the surface of fused silica by laser is carried out according to the following steps:

[0039] S1. The Gaussian ablation pit is a linear structure, and the Gaussian ablation pits of each linear structure together form a one-dimensional sinusoidal phase grating, and the CO is set accordingly. 2 The parameters of the laser: the power of the laser is 56W, the continuous laser output, the diameter of the focused spot size is 120μm, and the scanning speed is 3m / s.

[0040] S2, CO 2 The laser emits continuous CO 2 The laser beam is focused and irradiated on the surface of the fused silica along a straight path, and a Gaussian ablation pit with a smooth surface and a linear structure is formed on the surface of the fused silica.

[0041] S3. Use a microscope and a step meter to check whether the surface morphology and contour of the linearly structured Gaussian ablation pits fo...

Embodiment 2

[0047] See Figure 6-Figure 9 , a CO 2 The method of directly preparing sinusoidal phase grating on the surface of fused silica by laser is carried out according to the following steps:

[0048] S1. The Gaussian ablation pit is a point-like structure, each Gaussian ablation pit is distributed in a matrix, and there are four Gaussian ablation pits arranged in a square evenly distributed around each Gaussian ablation pit. Together to form a two-dimensional sinusoidal phase grating, according to which the CO is set 2 The parameters of the laser: the power of the laser is 200W, the pulse width is 20μs, the frequency is 200Hz, the diameter of the focusing spot is 220μm, and the scanning speed is 24mm / s.

[0049] S2, CO 2 The laser emits a single pulse of CO 2 The laser beam is focused and irradiated on the surface of the fused silica to ablate the surface of the fused silica to form a Gaussian ablation pit with a smooth surface and a matrix distribution.

[0050] S3. Use a mic...

Embodiment 3

[0056] See Figure 10-Figure 13 , a CO 2 The method of directly preparing sinusoidal phase grating on the surface of fused silica by laser is carried out according to the following steps:

[0057] S1. The Gaussian ablation pit is a point-like structure, each Gaussian ablation pit is distributed in a two-dimensional array, and there are six Gaussian ablation pits arranged in a regular hexagon evenly distributed around each Gaussian ablation pit etched pits, which together form a two-dimensional sinusoidal phase grating, according to which the CO is set 2 The parameters of the laser: the power of the laser is 200W, the pulse width is 20μs, the frequency is 200Hz, the diameter of the focusing spot is 220μm, and the scanning speed is 24mm / s.

[0058] S2, CO 2 The laser emits a single pulse of CO 2 The laser beam is focused and irradiated on the surface of the fused silica to ablate the surface of the fused silica to form a Gaussian ablation pit with a smooth surface and a matr...

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Abstract

The invention discloses a CO 2 The method of directly preparing sinusoidal phase grating on the surface of fused silica by laser is carried out according to the following steps: S1. Setting CO 2 Laser parameters; S2, ablation on the surface of fused silica to form a smooth Gaussian ablation pit; S3, check whether the surface morphology and contour of the Gaussian ablation pit have no ablation deposition; S4, on the fused silica The surface is ablated to form an adjacent Gaussian ablation pit; S5, step S4 is repeated until each Gaussian ablation pit forms a preset sinusoidal phase grating. The above method is cost-effective and can utilize CO 2 The laser directly prepares sinusoidal phase gratings on the surface of fused silica, which not only can realize one-dimensional sinusoidal phase gratings, but also can easily and flexibly realize the preparation of two-dimensional sinusoidal phase gratings with various structures, and the prepared sinusoidal phase gratings have a high laser damage threshold, which can be realized Strong laser beam splitting has important applications in the field of multi-beam interference microstructure laser processing.

Description

technical field [0001] The invention relates to the technical field of optical element preparation, in particular to a CO 2 A method for directly fabricating sinusoidal phase gratings on the surface of fused silica by laser. Background technique [0002] The sinusoidal phase grating has a wide range of applications in light wave transformation due to its high energy utilization. Traditionally, the preparation methods of sinusoidal phase gratings mainly include photolithography, focused ion beam etching, electron beam lithography, nanoimprinting and thermal imprinting, etc. Among them, photolithography, focused ion beam etching and electron beam Although photolithography has high preparation quality, the preparation process is not only cumbersome and time-consuming, but also expensive; while nanoimprinting and thermal imprinting techniques are difficult to apply to hard and brittle fused silica materials. [0003] Currently, laser technology has been used to process fused s...

Claims

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Application Information

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IPC IPC(8): G02B5/18B23K26/362
CPCG02B5/1857B23K26/362
Inventor 张传超王海军陈静蒋晓龙方振华廖威张丽娟蒋晓东朱启华
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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