A correction method and system for optical proximity effect

A technology of optical proximity effect and correction coefficient, which is applied in optics, components used for optomechanical processing, optomechanical equipment, etc., can solve problems such as slow convergence speed, reduce the number of corrections, speed up convergence speed, and achieve good convergence effects Effect

Active Publication Date: 2021-11-02
南京晶驱集成电路有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This process is repeated until the edge placement error reaches an acceptable value, but the convergence rate is too slow due to the fixed ratio used in the iterative process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A correction method and system for optical proximity effect
  • A correction method and system for optical proximity effect
  • A correction method and system for optical proximity effect

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0048] Optical proximity correction (optical proximity correction, OPC) is a lithographic enhancement technology, optical proximity correction is mainly used in the production process of semiconductor chips, the purpose is to ensure that the edge of the design pattern is completely etched during the production process. Irregularities in these projected images, such as narrower or wider line widths than designed, can be compensated for by changing the reticle. Other...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method and system for correcting optical proximity effect, comprising: acquiring characteristic patterns, arranging the characteristic patterns to form a plurality of matrix models; correcting the characteristic patterns in each of the matrix models, and obtain the average corrected movement amount of the feature pattern; obtain the design pattern, and correct the design pattern according to the average corrected movement amount; obtain the mask pattern and edge placement error after the correction of the design pattern; judge the edge Whether the placement error is less than the threshold; when the edge placement error is less than the threshold, output the mask pattern; when the edge placement error is greater than or equal to the threshold, obtain the new corrected movement amount, and according to the new The positive movement amount of , corrects the design pattern. With the optical proximity effect correction method and system provided by the present invention, the correction time and the correction times can be reduced.

Description

technical field [0001] The invention belongs to the field of integrated circuit manufacturing, in particular to a method and system for correcting optical proximity effects. Background technique [0002] Optical proximity correction (optical proximity correction, OPC) is a lithographic enhancement technology, optical proximity correction is mainly used in the production process of semiconductor chips, the purpose is to ensure that the edge of the design pattern is completely etched during the production process. [0003] Among them, the model-based optical proximity effect correction uses the optical model and the photoresist chemical reaction model to calculate the pattern after exposure. The model-based optical proximity effect correction first needs to identify the edges of the design pattern, so that each edge can move freely , the optical model simulates the pattern of the photoresist after exposure and compares it with the design pattern. The difference between them is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/36G03F7/20
CPCG03F1/36G03F7/70441
Inventor 赵广罗招龙李可玉洪银
Owner 南京晶驱集成电路有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap