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Device and method for processing two-dimensional nanostructure

A two-dimensional nanostructure and nanotechnology, which is applied in the field of near-field optics and nanolithography, can solve the problems that the nanostructure cannot be controlled and the size and range of the thermal field cannot be effectively controlled, and the effect of accurate manufacturing can be achieved.

Pending Publication Date: 2021-07-27
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

The enhanced near-field is the electromagnetic energy field and thermal field of the probe tip. There are energy and field space ranges. However, the controllable adjustment of the enhanced near-field and the controllable fabrication of nanostructures have always been new functions. It is difficult to effectively break through the difficulty of manufacturing nanostructures of chemical devices. The existing methods are fixed in changing the laser energy to control the enhanced near-field, but the change of laser energy affects the thermal field of the AFM probe, and the electromagnetic energy field generated can only It is fixed at a certain value and is not affected by the change of laser energy. Macroscopically, the manufacture of nanostructures is achieved through temperature rise. The result of temperature change is to remove and process the sample to form a "pit" structure, and this method cannot Effective control of the size and range of the thermal field prevents the controllable manufacture of nanostructures

Method used

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  • Device and method for processing two-dimensional nanostructure
  • Device and method for processing two-dimensional nanostructure
  • Device and method for processing two-dimensional nanostructure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] A device for processing two-dimensional nanostructures, which is realized by non-contact processing by adjusting the laser wavelength to induce controllable enhanced near-field, the device includes a fiber laser controller 9, a multi-wavelength single-mode fiber continuous laser 10, and a laser collimator 11 , CCD infrared camera 12, X-axis precision moving stage 18, Y-axis precision moving stage 19, Z-axis precision moving stage 20, 360-degree rotating stage 17, control host 14, display 13, atomic force microscope 21, said atomic force microscope 21 includes The sample stage 16 , the piezoelectric ceramic 15 and the AFM probe 4 , the AFM probe 4 includes a cantilever arm 41 and a needle tip 42 . The control host 14 is connected to the atomic force microscope 21 and the display 13. All operations are input through the display 13 and sent to the control host 14 to control the operation of the atomic force microscope 21. The piezoelectric ceramic 15 is located under the sa...

Embodiment 2

[0048] refer to figure 1 In (a)-(d), a method for processing two-dimensional nanostructures, using a multi-wavelength single-mode fiber continuous laser composite atomic force microscope probe device, by adjusting the laser output wavelength to induce a controllable enhanced near-field, to non-contact The surface of the sample is processed by means of the following steps:

[0049] Set the scanning range of the atomic force microscope 21 through the display 13 to 8um*8um, the scanning speed to 0.4 microns / second, and the graphic resolution to 512, and then use the piezoelectric ceramics 15 to drive the sample stage 16 to move upwards along the Z-axis to reach the AFM probe 4 contact, and then stop the rising of the sample stage 16, and control the piezoelectric ceramic 15 with the control host 14 to drive the sample stage 16 to move in the X / Y plane, complete the initial scanning of the processed plane, and eliminate the influence of surface impurities.

[0050] The atomic for...

Embodiment 3

[0056] The only difference between this embodiment and Embodiment 1 is that the path program adopts the nanowire path, and the laser power is set to 150 mW.

[0057] Refer to as figure 1 In (a) and (e) to (g), a method of manufacturing a two-dimensional nanostructure, using such as figure 2 The device shown is completed and includes the following steps:

[0058] S1, complete as figure 1 Empty sweep as shown in (a);

[0059] S2. Execute the nanowire path: set the laser wavelength to 532 nanometers, perform processing and scanning, and obtain such as figure 1 (e) nanowire protrusions 5 of 3nm-5nm shown;

[0060] S3. Move the sample stage 16 to another position, set the laser wavelength to 800 nanometers, continue to execute the nanowire path, and obtain such as figure 1 (f) shows the nanometer shallow groove 6, move the sample stage to another position again, set the laser wavelength to 1064 nanometers, execute the nanowire path, and obtain the following image after proces...

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Abstract

The invention discloses a device and method for processing a two-dimensional nano structure, belongs to the field of near-field optics and nano photoetching, and aims to overcome the defects in the prior art, an optical fiber continuous laser composite AFM probe induction near field enhancement technology is adopted, a controllable form of a two-dimensional nanostructure is manufactured by adjusting the laser wavelength and inducing a controllable enhanced near field, the change of the laser wavelength can cause an AFM probe enhanced electromagnetic field to generate a het-bond, the AFM probe enhanced electromagnetic field can generate a het-bond, the morphological change of the nanostructure is determined according to the relative magnitude of energy required for enhancing the near field and the surface structure change of the sample. According to the method, the probe does not need to be replaced and damaged, nanostructures in different forms are rapidly and accurately manufactured in a non-contact mode, the pattern writing time is in the microsecond level, and the requirement of device manufacturing can be met.

Description

technical field [0001] The invention belongs to the technical field of near-field optics and nanometer lithography, and in particular relates to a method for controllably manufacturing a two-dimensional nanostructure by using a fiber laser composite atomic force microscope (AFM) probe. Background technique [0002] At present, as the requirements for device performance are getting higher and higher, the traditional device manufacturing method has been emphasizing the reduction of the structural feature size, but the problem is that the manufacturing method is becoming more and more complicated and the cost has risen sharply, while single-electronic devices, New functional devices based on quantum devices and molecular devices, while meeting high performance requirements, realize their structure-controllable manufacturing, which poses new challenges to nano-manufacturing methods. Here, structure-controllable manufacturing refers to new functional devices. There are nano-protr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q60/42
CPCG01Q60/42
Inventor 崔健磊尹海龙梅雪松王学文王文君凡正杰刘斌段文强
Owner XI AN JIAOTONG UNIV
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