Shooting device position correction system and method

Abstract

The embodiment of the present invention relates to the field of semiconductor lithography technology, and discloses a system and method for correcting the position of a photographing device. The position correction system for a photographing device includes: a photographing device, a distance sensing device, a distance adjusting device, and a control device; It is used to capture the mask image and send the mask image to the control device, wherein the mask image captured by the shooting device at the theoretical position can be used to extract the mask mark through the control device; the distance sensing device is used to sense the actual position of the shooting device , and send the actual position to the control device; the control device is used to receive the mask image and judge whether the mask mark can be extracted from the mask image. control the distance adjusting device to move the photographing device. The system and method for correcting the position of the photographing device provided by the present invention can automatically correct the position of the photographing device, improve work efficiency and reduce manpower loss.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of semiconductors, and in particular to a system and method for correcting the position of a photographing device. Background technique [0002] Currently, the semiconductor integrated circuit (IC) industry has experienced exponential growth, wherein each generation of ICs has smaller and more complex circuits than the previous generation of ICs. In the course of IC evolution, functional density (ie, the number of interconnected devices per chip area) has generally increased, while geometry size (ie, the smallest component that can be created using a fabrication process) has decreased. In addition to the smaller and more complex IC components, the wafers used to manufacture ICs are also getting smaller, which requires higher and higher quality wafers. [0003] The exposure process of the wafer plays a vital role in the smooth progress of the entire photolithography process. Before the ...

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Problems solved by technology

[0004] The inventors have found that at least the following problems exist in the prior art: the above-mentioned process of adjusting the position of the shooting device takes a long time, which makes the work efficiency of the machine not high, and requires manual adjustment of the shooting device, which wastes a lot of manpower

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